SCHEMBL444286

SCHEMBL444286

CCO[SiH2]CCCNCCN

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 5/20 0.44
CA6 P23280 5/20 0.44
CA7 P43166 5/20 0.44
CA9 Q16790 5/20 0.44
CA14 Q9ULX7 5/20 0.44
CA5B Q9Y2D0 5/20 0.44
CA2 P00918 4/20 0.44
CA4 P22748 4/20 0.44
CA5A P35218 4/20 0.44
CA3 P07451 3/20 0.44
MEN1 O00255 3/20 0.42
KMT2A Q03164 3/20 0.42
RECQL P46063 2/20 0.42
LMNA P02545 3/20 0.40
TDP1 Q9NUW8 3/20 0.40
ALOX15 P16050 3/20 0.40
ALDH1A1 P00352 3/20 0.40
CA1 P00915 2/20 0.40
TP53 P04637 1/20 0.40
KDM4E B2RXH2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28097925 0.98 CA12 (0.44) CA12CA6CA7CA9CA14
SCHEMBL5603730 0.91 CYP2C19 (0.38) MEN1KMT2AALDH1A1CYP2C19CYP1A2
SCHEMBL15127341 0.90 CA12 (0.46) CA12CA6CA7CA9CA14
Acetic Acid SCHEMBL28167607 0.89 ALDH1A1 (0.42) CA12CA6CA7CA9CA14
SCHEMBL18329453 0.85 TSHR (0.44) MEN1KMT2AALDH1A1CYP2C19CYP1A2
SCHEMBL337040 0.82
SCHEMBL7640462 0.80 CA12 (0.41) CA12CA6CA7CA9CA14
SCHEMBL30977790 0.80 KDM4E (0.40) MEN1KMT2ALMNATDP1ALDH1A1
Hydrochloric Acid SCHEMBL28176343 0.80
SCHEMBL11180905 0.80 ALDH1A1 (0.40) CA12CA6CA7CA9CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112625468-A Multifunctional composite coating and preparation method thereof 舾蒙新材料科技(上海)有限公司 2021-04-09 CN claimed
CN-112625470-A Normal-temperature curing inorganic coating and preparation method thereof 舾蒙新材料科技(上海)有限公司 2021-04-09 CN claimed
CN-112625469-A High-temperature-resistant metal plate adopting inorganic coating and preparation method thereof 舾蒙新材料科技(上海)有限公司 2021-04-09 CN claimed
CN-112625467-A Self-demoulding mould and preparation method thereof 舾蒙新材料科技(上海)有限公司 2021-04-09 CN claimed
WO-2010054975-A1 PROCESS FOR THE DISTRIBUTION OF SILICATES IN COATING MATERIALS BASF SE (DE) 2010-05-20 WO claimed
US-5234983-A Sublimation-transfer receptor-surface coating for ceramic articles VALENTY VIVIAN B (US) 1993-08-10 US claimed
EP-0541074-A2 Non-pollution sealant compound SUNRISE MEISEI CORPORATION (JP) 1993-05-12 EP claimed
CN-111117531-B Adhesive composition and use thereof 长兴化学工业(中国)有限公司 2021-12-10 CN disclosed
CN-112625467-A Self-demoulding mould and preparation method thereof 舾蒙新材料科技(上海)有限公司 2021-04-09 CN disclosed
CN-112625469-A High-temperature-resistant metal plate adopting inorganic coating and preparation method thereof 舾蒙新材料科技(上海)有限公司 2021-04-09 CN disclosed
CN-112625468-A Multifunctional composite coating and preparation method thereof 舾蒙新材料科技(上海)有限公司 2021-04-09 CN disclosed
CN-112625470-A Normal-temperature curing inorganic coating and preparation method thereof 舾蒙新材料科技(上海)有限公司 2021-04-09 CN disclosed
CN-109804102-B Surface treatment solution composition, galvanized steel sheet surface-treated with the composition, and method for producing the same POSCO公司 2021-03-12 CN disclosed
US-7256496-B2 Semiconductor device having adhesion increasing film to prevent peeling CASIO COMPUTER CO., LTD. (JP) 2007-08-14 US disclosed
US-20050269698-A1 Semiconductor device having adhesion increasing film and method of fabricating the same CASIO COMPUTER CO., LTD. (JP) 2005-12-08 US disclosed
US-6440519-B1 FAST CURE SPEED AND SUPERIOR ADHESION UNDER HIGH TEMPERATURE-HIGH HUMIDITY CONDITIONS AND METAL CORROSION PROPERTIES DSM N.V. (NL) 2002-08-27 US disclosed
EP-0960355-A1 PHOTOCURABLE RESIN COMPOSITION DSM N.V. (NL) 1999-12-01 EP disclosed
EP-0866786-A1 BASIC CATALYSTS FOR THE ALDOL REACTION Novartis AG (CH) 1998-09-30 EP disclosed
WO-1998036325-A1 PHOTOCURABLE RESIN COMPOSITION DSM N.V. (NL) 1998-08-20 WO disclosed
WO-1997021659-A1 BASIC CATALYSTS FOR THE ALDOL REACTION NOVARTIS AG (CH) 1997-06-19 WO disclosed