SCHEMBL4447071

SCHEMBL4447071

CCCC[Si](C)(C)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1494412 0.90
SCHEMBL3986839 0.88 TSHR (0.47)
SCHEMBL1494309 0.88 TSHR (0.47)
SCHEMBL1344984 0.88 TSHR (0.47)
SCHEMBL1494461 0.88 TSHR (0.47)
SCHEMBL1494509 0.88 TSHR (0.47)
SCHEMBL1494519 0.88 TSHR (0.47)
SCHEMBL29449243 0.88 TSHR (0.47)
SCHEMBL1494464 0.88 TSHR (0.47)
SCHEMBL29449275 0.88 TSHR (0.47)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101886255-A Use contains the dielectric barrier deposition of nitrogen precursor AIR PROD & CHEM 2010-11-17 CN claimed
US-20260132225-A1 METHOD FOR PRODUCING POWDERED SILYLATED CELLULOSE DOW SILICONES CORP (US) 2026-05-14 US disclosed
US-20260018421-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD CENTRAL GLASS CO LTD (JP) 2026-01-15 US disclosed
US-20250343040-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD CENTRAL GLASS CO LTD (JP) 2025-11-06 US disclosed
EP-4535405-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD Central Glass Company, Limited (JP) 2025-04-09 EP disclosed
EP-4535406-A1 SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD Central Glass Company, Limited (JP) 2025-04-09 EP disclosed
CN-113169060-B Chamfering part treating agent composition and method for manufacturing wafer 中央硝子株式会社 2025-04-01 CN disclosed
CN-119278504-A Substrate processing method and substrate manufacturing method 中央硝子株式会社 2025-01-07 CN disclosed
CN-119278503-A Substrate processing method and substrate manufacturing method 中央硝子株式会社 2025-01-07 CN disclosed
WO-2024248021-A1 FILM-FORMING COMPOSITION, METHOD FOR PRODUCING SUBSTRATE, AND METHOD FOR PRODUCING FILM-FORMING COMPOSITION セントラル硝子株式会社 2024-12-05 WO disclosed
WO-2008054117-A1 TRANSITION METAL CATALYTIC SYSTEMS AND METHODS FOR PREPARING ETHYLENE HOMOPOLYMERS OR COPOLYMERS OF ETHYLENE AND OLEFINS USING THE SAME SK ENERGY CO., LTD. (KR) 2008-05-08 WO disclosed
CN-1295235-C Process for preparing primary aminoorganosilanes CROMPTON CORP (US) 2007-01-17 CN disclosed
CN-1896080-A Process for preparing primary aminoorganosilanes GEN ELECTRIC (US) 2007-01-17 CN disclosed
CN-1479743-A Process for preparing primary aminoorganosilanes ��³�նٹ�˾ 2004-03-03 CN disclosed
CN-1372571-A Process for producing substantially amorphous propylene-based polymers BASELL TECHNOLOGY CO B V (NL) 2002-10-02 CN disclosed
CN-1357014-A Ethylene and/or alpha-olefin/vinyl or vinylidene aromatic interpolymer composition DOW CHEMICAL CO (US) 2002-07-03 CN disclosed
CN-1079700-C Bridged bis-amino group 4 metal compounds in catalyst compositions SHELL INTERNATIONALS RES MIJ B (NL) 2002-02-27 CN disclosed
EP-0830136-A4 NEW CRYPTOPHYCINS FROM SYNTHESIS UNIV HAWAII (US) 2001-01-24 EP disclosed
EP-0830136-A1 NEW CRYPTOPHYCINS FROM SYNTHESIS UNIVERSITY OF HAWAII (US) 1998-03-25 EP disclosed
WO-1996040184-A1 NEW CRYPTOPHYCINS FROM SYNTHESIS UNIVERSITY OF HAWAII (US) 1996-12-19 WO disclosed