⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14721708 | 1.00 | — | — | |
| SCHEMBL24604 | 1.00 | — | — | |
| Water SCHEMBL2687435 | 0.89 | — | — | |
| SCHEMBL2043839 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL10488807 | 0.89 | — | — | |
| SCHEMBL2044940 | 0.89 | — | — | |
| Ammonia Solution, Strong SCHEMBL9317182 | 0.89 | — | — | |
| SCHEMBL3133499 | 0.89 | — | — | |
| Helium SCHEMBL7068545 | 0.89 | — | — | |
| SCHEMBL729481 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120065896-A1 | BIOLOGICAL AND CHEMICAL TEST MEDIA AND SYSTEM | SELINFREUND RICHARD H (US) | 2012-03-15 | — | — | US | claimed |
| US-5922622-A | Pattern formation of silicon nitride | VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION (TW) | 1999-07-13 | — | — | US | claimed |
| US-5872061-A | Plasma etch method for forming residue free fluorine containing plasma etched layers | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 1999-02-16 | — | — | US | claimed |
| WO-2022114928-A1 | BATTERY, AND ELECTRONIC DEVICE INCLUDING SAME | 삼성전자 주식회사 | 2022-06-02 | — | — | WO | disclosed |
| CN-209537348-U | Using the device of rectifying and adsorption combined mode high purity tetrafluoromethane | 天津市泰源工业气体有限公司 | 2019-10-25 | — | — | CN | disclosed |
| CN-109955567-A | Waterproofness transparent membrane, the manufacturing method of waterproofness transparent membrane, display and pH effect film | 株式会社神户制钢所 | 2019-07-02 | — | — | CN | disclosed |
| US-20120065896-A1 | BIOLOGICAL AND CHEMICAL TEST MEDIA AND SYSTEM | SELINFREUND RICHARD H (US) | 2012-03-15 | — | — | US | disclosed |
| CN-101007757-B | Liquid-phase (amm)oxidation process | Rohm and Haas Co. (US) Independence Mall West, Philadelphia, Pennsylvania. U.S.A (US) | 2012-02-08 | — | — | CN | disclosed |
| CN-102150032-A | Diagnostic system with portable collection housing | SONY DADC | 2011-08-10 | — | — | CN | disclosed |
| US-20110180313-A1 | METHOD OF FORMING CIRCUIT INTERCONNECTION, CIRCUIT BOARD, AND CIRCUIT INTERCONNECTION FILM HAVING FILM THICKNESS LARGER THAN WIDTH THEREOF | SEIKO EPSON CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |
| US-20110174528-A1 | METHOD OF FORMING CIRCUIT INTERCONNECTION, CIRCUIT BOARD, AND CIRCUIT INTERCONNECTION FILM HAVING FILM THICKNESS LARGER THAN WIDTH THEREOF | SEIKO EPSON CORPORATION (JP) | 2011-07-21 | — | — | US | disclosed |
| US-6008137-A | Pattern formation of silicon nitride | VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION (TW) | 1999-12-28 | — | — | US | disclosed |
| US-5942446-A | SUBSTRATE HAVING SILICON CONTAINING DIELECTRIC LAYER AND HARD MASK LAYER IS PARTIALLY PLASMA ETCHED BY ETCHANT GAS COMPRISING FLUOROCARBON GAS, FORMING FLUOROCARBON POLYMER HARD MASK LAYER; FURTHER PLASMA ETCHING WITH FLUORO ETCHANT GAS | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 1999-08-24 | — | — | US | disclosed |
| US-5938422-A | Removal of noxious substances from gas streams | THE BOC GROUP PLC (GB) | 1999-08-17 | — | — | US | disclosed |
| US-5922622-A | Pattern formation of silicon nitride | VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION (TW) | 1999-07-13 | — | — | US | disclosed |
| US-5872061-A | Plasma etch method for forming residue free fluorine containing plasma etched layers | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 1999-02-16 | — | — | US | disclosed |
| EP-0802370-A2 | Removal of noxious substances from gas streams | The BOC Group plc (GB) | 1997-10-22 | — | — | EP | disclosed |
| CN-1161952-A | Method for production of perfluorocarbon | SHOWA DENKO KK (JP) | 1997-10-15 | — | — | CN | disclosed |
| US-5587110-A | CARBON FLUORIDE PARTICLES | DAIKIN INDUSTRIES, LTD. (JP) | 1996-12-24 | — | — | US | disclosed |
| US-4028155-A | \"COLD\" PLASMA OF OXYGEN, A HALOGEN COMPOUND, AND A NOBLE GAS CARRIER | LFE CORPORATION (US) | 1977-06-07 | — | — | US | disclosed |