⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL444758 | 0.89 | — | — | |
| SCHEMBL24604 | 0.89 | — | — | |
| SCHEMBL14721708 | 0.89 | — | — | |
| SCHEMBL729481 | 0.80 | — | — | |
| Hydrochloric Acid SCHEMBL10488807 | 0.80 | — | — | |
| SCHEMBL2044940 | 0.80 | — | — | |
| Water SCHEMBL2687435 | 0.80 | — | — | |
| SCHEMBL3133499 | 0.80 | — | — | |
| Ammonia Solution, Strong SCHEMBL9317182 | 0.80 | — | — | |
| SCHEMBL2043839 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6551576-B1 | Container of a single perfluorocarbon gas, and an aqueous lipid suspension phase comprises a phosphatidyl choline, phosphatidylethanolamine, and/or a phosphatidic acid; use in diagnostic imaging; magnetic resonance imaging | BRISTOL-MYERS SQUIBB MEDICAL IMAGING, INC. | 2003-04-22 | — | — | US | disclosed |
| CN-1411040-A | Dry etching method for manufacturing semiconductor assembly | WANGHONG ELECTRONICS CO LTD (CN) | 2003-04-16 | — | — | CN | disclosed |
| US-20030068898-A1 | Dry etching method for manufacturing processes of semiconductor devices | MACRONIX INTERNATIONAL CO., LTD. (TW) | 2003-04-10 | — | — | US | disclosed |
| JP-2001274111-A | CHEMICAL PLASMA CLEANING FOR SALICIDE PROCESS | APPLIED MATERIALS INC | 2001-10-05 | — | — | JP | disclosed |
| US-5203957-A | Contact sidewall tapering with argon sputtering | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 1993-04-20 | — | — | US | disclosed |