⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9404079 | 0.83 | — | — | |
| SCHEMBL28485008 | 0.82 | TRPA1 (0.39) | — | |
| SCHEMBL4823706 | 0.77 | — | — | |
| SCHEMBL1493116 | 0.71 | — | — | |
| SCHEMBL5695282 | 0.71 | — | — | |
| SCHEMBL120668 | 0.71 | — | — | |
| SCHEMBL20660 | 0.71 | — | — | |
| SCHEMBL55475 | 0.71 | — | — | |
| SCHEMBL10421619 | 0.69 | — | — | |
| SCHEMBL10421618 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2276793-B1 | SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS | ESSILOR INT (FR) | 2012-08-01 | — | — | EP | claimed |
| US-8063237-B2 | Sulfur modified silanes for the elaboration of high refractive index materials | ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) | 2011-11-22 | — | — | US | claimed |
| US-20110077341-A1 | SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS | ESSILOR INTERNATIONAL (FR) | 2011-03-31 | — | — | US | claimed |
| EP-2276793-A1 | SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS | Essilor International (Compagnie Générale d'Optique) (FR) | 2011-01-26 | — | — | EP | claimed |
| WO-2009138853-A1 | SULFUR MODIFIED SILANES FOR THE ELABORATION OF HIGH REFRACTIVE INDEX MATERIALS | ESSILOR INTERNATIONAL (FR) | 2009-11-19 | — | — | WO | claimed |
| WO-2022129201-A1 | PLATELET-LIKE MATTING AGENT FOR POWDER COATING AND POWDER COATINGS | ECKART GMBH (DE) | 2022-06-23 | — | — | WO | disclosed |
| CN-107109130-B | Polysiloxanes as anti-adhesion and anti-fouling additives, method for their production and use | 毕克化学有限公司 | 2019-12-31 | — | — | CN | disclosed |
| CN-110191889-A | Silsesquioxane derivative, its composition and low cure shrinkage cured film with free-radical polymerised functional group | 捷恩智株式会社 | 2019-08-30 | — | — | CN | disclosed |
| US-9938432-B2 | Polysiloxanes as anti-adhesive and dirt-repellant additives, method for the production and use thereof | BYK Chemie, GmbH (DE) | 2018-04-10 | — | — | US | disclosed |
| US-20170247572-A1 | POLYSILOXANES AS ANTI-ADHESIVE AND DIRT-REPELLANT ADDITIVES, METHOD FOR THE PRODUCTION AND USE THEREOF | BYK-CHEMIE GMBH (DE) | 2017-08-31 | — | — | US | disclosed |
| CN-107109130-A | As anti-adhesion and the polysiloxanes of antifoulant additive, it is produced and application method | 毕克化学有限公司 | 2017-08-29 | — | — | CN | disclosed |
| US-9175141-B2 | Cyclosiloxane-substituted polysiloxane compounds, compositions containing the compounds and methods of use thereof | BIOFILM IP, LLC (US) | 2015-11-03 | — | — | US | disclosed |
| US-20030045648-A1 | (Meth)acryloyl group-modified ethylene-alpha-olefin copolymer, production method thereof and rubber composition | JSR CORPORATION (JP) | 2003-03-06 | — | — | US | disclosed |
| EP-1266912-A1 | (Meth)acryloyl group-modified ethylene-alpha-olefin copolymer, production method thereof and rubber composition | JSR Corporation (JP) | 2002-12-18 | — | — | EP | disclosed |
| US-6156468-A | Blocking layer with light scattering particles having rough surface | XEROX CORPORATION (US) | 2000-12-05 | — | — | US | disclosed |
| US-5958638-A | COMPRISING UNDERCOAT LAYER ON CONDUCTIVE SUBSTRATE AND PHOTOSENSITIVE LAYER FORMED ON UNDERCOAT LAYER; UNIFORM CHARGEABILITY TO PREDETERMINED POTENTIAL, LOW RESIDUAL POTENTIAL, STABILITY AFTER REPEATED USE | SHARP KABUSHIKI KAISHA (JP) | 1999-09-28 | — | — | US | disclosed |
| EP-0887711-A1 | Electrophotographic photoconductor and method of producing same | SHARP KABUSHIKI KAISHA (JP) | 1998-12-30 | — | — | EP | disclosed |
| EP-0857727-A2 | Polymerization of vinyl monomers from silanes and siloxanes | DOW CORNING CORPORATION (US) | 1998-08-12 | — | — | EP | disclosed |
| US-5789503-A | Polymerization of vinyl monomers from silanes and siloxanes | DOW CORNING CORPORATION (US) | 1998-08-04 | — | — | US | disclosed |
| US-5708115-A | OZONIDE GROUPS, FREE RADICAL CATALYSTS | DOW CORNING CORPORATION (US) | 1998-01-13 | — | — | US | disclosed |