SCHEMBL4453656

SCHEMBL4453656

CC1(C)CN=CN1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7009809 0.67
SCHEMBL21439860 0.61
SCHEMBL16247918 0.60
SCHEMBL12186300 0.59
SCHEMBL21374382 0.56
SCHEMBL215857 0.55
SCHEMBL1377060 0.52 ALDH1A1 (0.32)
SCHEMBL2020974 0.51
SCHEMBL6909549 0.51
SCHEMBL22126088 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210102027-A1 Potting Compound and Insulating Material SIEMENS AKTIENGESELLSCHAFT (DE) 2021-04-08 US claimed
EP-3523348-A1 POTTING COMPOUND, INSULATING MATERIAL, AND USE THEREOF Siemens Aktiengesellschaft (DE) 2019-08-14 EP claimed
CN-110023371-A Perfusion materia, insulating materials and application thereof 西门子股份公司 2019-07-16 CN claimed
WO-2018099891-A1 POTTING COMPOUND, INSULATING MATERIAL, AND USE THEREOF SIEMENS AKTIENGESELLSCHAFT (DE) 2018-06-07 WO claimed
US-20250043353-A1 BIOMARKERS OF RESPONSE TO SELECTIVE INHIBITORS OF AURORA A KINASE MILLENNIUM PHARM INC (US) 2025-02-06 US disclosed
US-20230406808-A1 DEHYDRATION OF LACTIC ACID AND RELATED COMPOUNDS IN SOLID ACIDS VIA MULTIFUNCTIONAL FLEXIBLE MODIFIERS NATIONAL SCIENCE FOUNDATION 2023-12-21 US disclosed
US-11548984-B2 Light- or heat-curing method and curable resin composition FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2023-01-10 US disclosed
WO-2022224699-A1 RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC PART, TWO-COMPONENT KIT AND METHOD FOR PRODUCING CURED PRODUCT 小西化学工業株式会社 2022-10-27 WO disclosed
CN-108602955-B Photocuring method, compound used in photocuring method, and composition 富士胶片和光纯药株式会社 2021-08-06 CN disclosed
US-20210102027-A1 Potting Compound and Insulating Material SIEMENS AKTIENGESELLSCHAFT (DE) 2021-04-08 US disclosed
CN-107848963-B Acid-resistant alkali-producing agent and/or radical-producing agent, and curable resin composition containing same 富士胶片和光纯药株式会社 2020-11-03 CN disclosed
US-10774062-B2 Photocuring method, compound and composition used therein FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2020-09-15 US disclosed
EP-3098226-A1 BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR Wako Pure Chemical Industries, Ltd. (JP) 2016-11-30 EP disclosed
US-20160340374-A1 BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2016-11-24 US disclosed
US-20140336158-A1 NK1 ANTAGONISTS TERSERA THERAPEUTICS LLC 2014-11-13 US disclosed
US-8796299-B2 NK1 antagonists OPKO HEALTH, INC. (US) 2014-08-05 US disclosed
US-7902366-B2 NK1 antagonists OPKO HEALTH, INC. (US) 2011-03-08 US disclosed
EP-0819000-B1 NODULISPORIC ACID DERIVATIVES MERCK & CO INC (US) 2009-07-08 EP disclosed
US-5962499-A ACARICIDAL, ANTIPARASITIC, INSECTICIDAL AND ANTHELMINTIC AGENTS MERCK & CO., INC. (US) 1999-10-05 US disclosed
WO-1996029073-A1 NODULISPORIC ACID DERIVATIVES MERCK & CO., INC. (US) 1996-09-26 WO disclosed