⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31124930 | 0.86 | — | — | |
| SCHEMBL4443682 | 0.84 | OPRM1 (0.44) | — | |
| SCHEMBL31124916 | 0.81 | TSHR (0.33) | — | |
| SCHEMBL311648 | 0.79 | — | — | |
| SCHEMBL20742943 | 0.77 | — | — | |
| Ammonia Solution, Strong SCHEMBL20742942 | 0.77 | — | — | |
| SCHEMBL75914 | 0.74 | TSHR (0.31) | — | |
| SCHEMBL2551822 | 0.73 | — | — | |
| Vinyl Ether SCHEMBL27650315 | 0.73 | — | — | |
| SCHEMBL4604387 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8211613-B2 | prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| EP-2159261-A1 | CURABLE FLUORINE-CONTAINING POLYMER COMPOSITION | Dow Corning Corporation (US) | 2010-03-03 | — | — | EP | disclosed |
| US-7528205-B2 | Photo radical generator, photo sensitive resin composition and article | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-05-05 | — | — | US | disclosed |
| US-20080275154-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | SAKAYORI KATSUYA | 2008-11-06 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |
| US-20050119432-A1 | Photo radical generator, photo sensitive resin composition and article | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-06-02 | — | — | US | disclosed |
| US-20040023159-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-02-05 | — | — | US | disclosed |
| US-6541535-B1 | Binder oligomer or polymer comprises terminally and/or laterally, at least one vinyl ether group a) and at least one group b) which is coreactive with the vinyl ether groups | BASF COATINGS AG (DE) | 2003-04-01 | — | — | US | disclosed |