SCHEMBL445462

SCHEMBL445462

C1=CCC([Sr]C2=CC=CC2)=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8356389 0.79
Tetrahydrofuran SCHEMBL8356450 0.69 ALDH1A1 (0.36)
Hydrochloric Acid SCHEMBL29080672 0.67
SCHEMBL8458318 0.65
SCHEMBL8025832 0.65
SCHEMBL19716243 0.65
SCHEMBL809545 0.65
SCHEMBL296237 0.65
SCHEMBL5345820 0.65
SCHEMBL10409928 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574675-B2 Method and composition for depositing ruthenium with assistive metal species ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2013-11-05 US claimed
US-20120064719-A1 METHOD AND COMPOSITION FOR DEPOSITING RUTHENIUM WITH ASSISTIVE METAL SPECIES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-03-15 US claimed
WO-2010107878-A2 METHOD AND COMPOSITION FOR DEPOSITING RUTHENIUM WITH ASSISTIVE METAL SPECIES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2010-09-23 WO claimed
US-6579509-B1 Method of cleaning of harmful gas and cleaning apparatus JAPAN PIONICS CO., LTD. (JP) 2003-06-17 US claimed
US-6473563-B2 Vaporizer and apparatus for vaporizing and supplying JAPAN PIONICS CO., LTD. (JP) 2002-10-29 US claimed
US-20020067917-A1 Vaporizer and apparatus for vaporizing and supplying JAPAN PIONICS CO., LTD. (JP) 2002-06-06 US claimed
EP-1211333-A2 Vaporizer for CVD apparatus JAPAN PIONICS CO., LTD. (JP) 2002-06-05 EP claimed
US-4092268-A POLYMERIZATION CATALYST OF AN ORGANO-LITHIUM INITIATOR, A BARIUM OR STRONTIUM COMPOUND, AND AN ORGANOMETALLIC ALUMINUM OR ZINC COMPOUND COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN, RAISON SOCIALE MICHELIN & CIE (FR) 1978-05-30 US claimed
US-4080492-A ORGANOLITHIUM INITIATOR AND COCATALYST CONTAINING BARIUM OR STRONTIUM COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN (FR) 1978-03-21 US claimed
EP-1880412-B1 METHOD FOR FORMING HIGH-RESOLUTION PATTERN WITH DIRECT WRITING MEANS LG CHEMICAL LTD (KR) 2017-11-29 EP disclosed
US-8574675-B2 Method and composition for depositing ruthenium with assistive metal species ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2013-11-05 US disclosed
US-20120064719-A1 METHOD AND COMPOSITION FOR DEPOSITING RUTHENIUM WITH ASSISTIVE METAL SPECIES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-03-15 US disclosed
US-8026510-B2 Organic electronic device and method for producing the same DAI NIPPON PRINTING CO., LTD. (JP) 2011-09-27 US disclosed
WO-2010107878-A2 METHOD AND COMPOSITION FOR DEPOSITING RUTHENIUM WITH ASSISTIVE METAL SPECIES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2010-09-23 WO disclosed
WO-2006121298-A1 METHOD FOR FORMING HIGH-RESOLUTION PATTERN WITH DIRECT WRITING MEANS LG CHEM, LTD. (KR) 2006-11-16 WO disclosed
US-20060081840-A1 Organic electronic device and method for producing the same JUNJI, KIDO (JP) 2006-04-20 US disclosed
US-6579509-B1 Method of cleaning of harmful gas and cleaning apparatus JAPAN PIONICS CO., LTD. (JP) 2003-06-17 US disclosed
US-6248605-B1 CERIUM DOPED STRONTIUM SULFIDE PHOSPHOR THIN FILMS FROM ORGANOMETALLIC CERIUM COMPOUND WITH CYCLOPENTADIENYL LIGAND PLANAR SYSTEMS INC. (FI) 2001-06-19 US disclosed
EP-0267377-B1 ELECTROLUMINESCENT DISPLAY APPARATUS AND PROCESS FOR PRODUCING THE SAME HITACHI, LTD. (JP) 1993-02-03 EP disclosed
EP-0267377-A1 Electroluminescent display apparatus and process for producing the same HITACHI, LTD. (JP) 1988-05-18 EP disclosed