Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | CA12 | O43570 | 3/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.41 |
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | MGAM | O43451 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | SI | P14410 | 1/20 | 0.39 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | POLA1 | P09884 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15308049 | 0.98 | TSHR (0.52) | TSHRKMT2AMEN1CA12CA14 | |
| SCHEMBL13699511 | 0.98 | TSHR (0.52) | TSHRKMT2AMEN1CA12CA14 | |
| SCHEMBL31110084 | 0.98 | TSHR (0.52) | TSHRKMT2AMEN1CA12CA14 | |
| SCHEMBL15308045 | 0.98 | TSHR (0.52) | TSHRKMT2AMEN1CA12CA14 | |
| SCHEMBL4060095 | 0.90 | TSHR (0.67) | TSHRKMT2AMEN1CA12CA14 | |
| SCHEMBL3682553 | 0.87 | TSHR (0.63) | TSHRKMT2AMEN1CA12CA14 | |
| SCHEMBL446205 | 0.86 | TSHR (0.52) | TSHRKMT2AMEN1CA12CA14 | |
| SCHEMBL8430516 | 0.86 | TSHR (0.58) | TSHRKMT2AMEN1CA12CA14 | |
| SCHEMBL20429066 | 0.86 | TSHR (0.44) | TSHRKMT2AMEN1CA12CA14 | |
| SCHEMBL8432325 | 0.85 | TSHR (0.56) | TSHRCA12CA14LMNACA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 328 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12637529-B2 | Resin composition and display device using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2026-05-26 | — | — | US | disclosed |
| WO-2025071108-A1 | RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2025-04-03 | — | — | WO | disclosed |
| CN-119065043-A | Composition, optical film, layer, optical filter, optical element, solid-state imaging device, and camera module | JSR株式会社 | 2024-12-03 | — | — | CN | disclosed |
| WO-2024158178-A1 | THERMOSETTING RESIN COMPOSITION, CURED FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2024-08-02 | — | — | WO | disclosed |
| WO-2024147537-A1 | RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2024-07-11 | — | — | WO | disclosed |
| CN-109976097-B | Method of forming micropattern and substrate processing apparatus | 三星电子株式会社 | 2024-06-18 | — | — | CN | disclosed |
| CN-110007563-B | Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element | 奇美实业股份有限公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| US-11708317-B2 | Process for the catalytic decarboxylative cross-ketonization of aryl and aliphatic carboxylic acid | RHODIA OPERATIONS (FR) | 2023-07-25 | — | — | US | disclosed |
| CN-108255017-B | Negative photosensitive resin composition | 株式会社东进世美肯 | 2023-03-31 | — | — | CN | disclosed |
| EP-1193557-A1 | Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20010044075-A1 | Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element | JSR CORPORATION (JP) | 2001-11-22 | — | — | US | disclosed |
| EP-1150165-A1 | Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element | JSR Corporation (JP) | 2001-10-31 | — | — | EP | disclosed |
| US-6168908-B1 | COATING AN ALKALI-SOLUBLE THERMOSETTING RESIN ON A SUBSTRATE, AND BAKING IT, COATING A RADIATION SENSITIVE RESIN ON THE COATED FILM, AND BAKING, EXPOSING THE RADIATION SENSITIVE FILM TO A RADIATION THROUGH A MASK AND BAKING, DEVELOPING | JSR CORPORATION (JP) | 2001-01-02 | — | — | US | disclosed |
| EP-1057859-A2 | Radiation sensitive resin composition and use of the same in an interlaminar insulating film | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-0562819-B1 | Resist coating composition | JSR CORP (JP) | 1999-12-01 | — | — | EP | disclosed |
| EP-0908780-A1 | Process for forming a cured film of a thermosetting resin | JSR Corporation (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0562819-A2 | Resist coating composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-09-29 | — | — | EP | disclosed |
| US-4978754-A | REACTING B-ALKOXY-SUBSTITUTED CARBOXYLATE WITH CYCLIC AMINE, REMOVING ALCOHOL IN PRESENCE OF BASIC CATALYST | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1990-12-18 | — | — | US | disclosed |
| EP-0321256-A2 | Process of preparing unsaturated carboxylic acid amides | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-06-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12637529-B2 | Resin composition and display device using the same | JMJD6, ALKBH2, ARID2 | TSHR 3217/4885KMT2A 189/4885MEN1 2316/4885 |
| US-11708317-B2 | Process for the catalytic decarboxylative cross-ketonization of aryl and aliphatic carboxylic acid | JMJD7, PDK2, PIR | TSHR 3280/4885KMT2A 404/4885MEN1 4608/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.