Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGAT1 | O75907 | 1/20 | 0.39 |
| ▸ | CYP4F2 | P78329 | 2/20 | 0.39 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.39 |
| ▸ | MGAM | O43451 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | SI | P14410 | 1/20 | 0.35 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 3/20 | 0.33 |
| ▸ | MMP8 | P22894 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 3/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Di(Hydroxyethyl)Ether SCHEMBL28738573 | 0.86 | CYP4F2 (0.50) | DGAT1CYP4F2CYP4A11PKMKMT2A | |
| SCHEMBL14351333 | 0.82 | CYP4F2 (0.39) | DGAT1CYP4F2CYP4A11MGAMGAA | |
| SCHEMBL29048965 | 0.82 | CYP4F2 (0.40) | CYP4F2CYP4A11MGAMGAASI | |
| SCHEMBL10359638 | 0.81 | CYP4F2 (0.41) | DGAT1CYP4F2CYP4A11TP53RAB9A | |
| SCHEMBL195662 | 0.80 | CYP4F2 (0.56) | CYP4F2CYP4A11MGAMGAASI | |
| SCHEMBL17358987 | 0.80 | DGAT1 (0.39) | DGAT1CYP4F2CYP4A11MGAMGAA | |
| SCHEMBL17486950 | 0.78 | DGAT1 (0.43) | DGAT1CYP4F2CYP4A11ALDH1A1TSHR | |
| SCHEMBL3075927 | 0.78 | CYP4F2 (0.38) | CYP4F2CYP4A11ALDH1A1TSHRCA2 | |
| SCHEMBL4919828 | 0.78 | CYP4F2 (0.46) | DGAT1CYP4F2CYP4A11LMNAALDH1A1 | |
| SCHEMBL15951338 | 0.77 | MGAM (0.36) | DGAT1MGAMGAASIMGAM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 174 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2044085-B1 | PENEM PRODRUGS | PFIZER PROD INC (US) | 2010-12-29 | — | — | EP | claimed |
| EP-1016698-B1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | MITSUBISHI RAYON CO (JP) | 2004-09-22 | — | — | EP | claimed |
| EP-1016699-A1 | Use of a solvent composition comprising an oxyisobutyric acid ester as a cleaning agent | Mitsubishi Rayon Co., Ltd. (JP) | 2000-07-05 | — | — | EP | claimed |
| EP-1016698-A1 | Use of a solvent composition containing an oxyisobutyric acid ester as a solvent in coatings, adhesives and printing inks | Mitsubishi Rayon Co., Ltd. (JP) | 2000-07-05 | — | — | EP | claimed |
| US-5630945-A | RECOVERING STYRENE, POLYESTER AND ACRYLIC RESIN FROM WASTE AS A SOLUTION AND RECOVERING SOLVENT WITH OXYISOBUTYRIC ACID ESTER | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-05-20 | — | — | US | claimed |
| US-5612303-A | HYDROXY OR ETHERIFIED ESTERS | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1997-03-18 | — | — | US | claimed |
| EP-0629671-A2 | Solvent composition | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-12-21 | — | — | EP | claimed |
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | claimed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |
| EP-4655300-A1 | PGDH INHIBITORS AND METHODS OF MAKING AND USING | Epirium Bio Inc. (US) | 2025-12-03 | — | — | EP | disclosed |
| US-20250321481-A1 | PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-10-16 | — | — | US | disclosed |
| US-20250189891-A1 | POLYIMIDE RESIN PRECURSOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-12 | — | — | US | disclosed |
| US-20250004372-A1 | BLOCK COPOLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-01-02 | — | — | US | disclosed |
| CN-118900872-A | Polyimide resin precursor | 东京应化工业株式会社 | 2024-11-05 | — | — | CN | disclosed |
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | disclosed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | disclosed |
| US-5041403-A | Magnesium, titanium, halogen, ester compound, and organic aluminum compound | SHOWA DENKO K.K. (JP) | 1991-08-20 | — | — | US | disclosed |
| EP-0383346-A2 | Catalyst, process for its preparation and process for polymerization of olefins using this catalyst | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1990-08-22 | — | — | EP | disclosed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | disclosed |