SCHEMBL4457865

SCHEMBL4457865

CCCCc1ccsc1CCCC

nearest known ligand 0.45

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
LTB4R Q15722 8/20 0.45
TYR P14679 1/20 0.38
CTRC Q99895 1/20 0.35
ADK P55263 1/20 0.34
PDE4A P27815 3/20 0.33
PDE4B Q07343 3/20 0.33
PDE4C Q08493 3/20 0.33
PDE4D Q08499 3/20 0.33
LIPG Q9Y5X9 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6890544 0.94 LTB4R (0.48) LTB4RTYRLIPG
SCHEMBL87684 0.94 LTB4R (0.47) LTB4RTYRLIPG
SCHEMBL31404133 0.92 LTB4R (0.47) LTB4RTYRLIPG
SCHEMBL3230612 0.92 LTB4R (0.46) LTB4RTYRLIPG
SCHEMBL28037072 0.92 LTB4R (0.49) LTB4RTYRLIPG
SCHEMBL27279723 0.92 LTB4R (0.49) LTB4RTYRLIPG
SCHEMBL28854260 0.92 LTB4R (0.49) LTB4RTYRLIPG
SCHEMBL6260351 0.92 LTB4R (0.49) LTB4RTYRLIPG
SCHEMBL15648187 0.92 LTB4R (0.49) LTB4RTYRLIPG
SCHEMBL14690810 0.92 LTB4R (0.49) LTB4RTYRLIPG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102391481-A Synthesis method of poly-thiophene-fullerene-polylactic acid triblock copolymer UNIV TONGJI 2012-03-28 CN claimed
CN-102391533-A Method for preparing nanometer ordered porous organic film based on polythiophene- fullerene- polylactic acid triblock copolymer UNIV TONGJI 2012-03-28 CN claimed
JP-3137649-A None JP disclosed
CN-117887045-A Electrochromic copolymer, preparation method thereof, electrochromic film and application 上海戎科特种装备有限公司 2024-04-16 CN disclosed
CN-117887045-A Electrochromic copolymer, preparation method thereof, electrochromic film and application 上海戎科特种装备有限公司 2024-04-16 CN disclosed
CN-113631606-A Compositions and methods for preparing silylated polymers and uses thereof 波利有限公司 2021-11-09 CN disclosed
WO-2021142656-A1 BENZO[1,2-B:4,5-C']DITHIOPHENE-4,8-DIONE-BASED POLYMER SOLAR CELLS SOUTHERN UNIVERSITY OF SCIENCE AND TECHNOLOGY. (CN) 2021-07-22 WO disclosed
WO-2021142656-A1 BENZO[1,2-B:4,5-C']DITHIOPHENE-4,8-DIONE-BASED POLYMER SOLAR CELLS SOUTHERN UNIVERSITY OF SCIENCE AND TECHNOLOGY. (CN) 2021-07-22 WO disclosed
CN-111000199-A Method for preparing thermal reaction salted egg yolk essence by micro-emulsification technology 湖南可菲香精香料科技有限公司 2020-04-14 CN disclosed
CN-104755556-B Electroconductive polymer/polyanionic complexes organic solvent dispersion, the conductive composition containing the organic solvent dispersion and the conductive film covering as made from the conductive composition 荒川化学工业株式会社 2018-12-14 CN disclosed
CN-108431093-A The manufacturing method of dispersion liquid containing electric conductive polymer 昭和电工株式会社 2018-08-21 CN disclosed
CN-101208815-A Organic photoactive component UNIV DRESDEN TECH (DE) 2008-06-25 CN disclosed
US-20070149639-A1 Polymerizable composition, optical material comprising the composition and method for producing the material HORIKOSHI HIROSHI 2007-06-28 US disclosed
EP-1524289-A1 POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2005-04-20 EP disclosed
US-20040254258-A1 Polymerizable composition, optical material comprising the composition and method for producing the material MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2004-12-16 US disclosed
US-5306601-A Laminating a semiconductor a polythiophenes layer, inorganic layer and photoresists layer, heating and hardening each layer MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1994-04-26 US disclosed
EP-0348961-B1 Fine pattern forming material and pattern forming method MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 1994-01-26 EP disclosed
EP-0530849-A2 Fine pattern forming material and pattern forming method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1993-03-10 EP disclosed
JP-H03137649-A FINE PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD MATSUSHITA ELECTRIC IND CO LTD 1991-06-12 JP disclosed
EP-0348961-A2 Fine pattern forming material and pattern forming method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1990-01-03 EP disclosed