SCHEMBL4463492

SCHEMBL4463492

C=CC(=O)OC(F)(F)C(F)(F)C(F)CF

nearest known ligand 0.32

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.32
ALDH1A1 P00352 4/20 0.32
TP53 P04637 3/20 0.32
HIF1A Q16665 3/20 0.32
CYP3A4 P08684 2/20 0.32
MAPK1 P28482 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2158902 0.86 ALDH1A1 (0.33) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL36392 0.84 TSHR (0.32) TSHRALDH1A1TP53HIF1ACYP3A4
Methane SCHEMBL29229975 0.83 TSHR (0.31) TSHRALDH1A1TP53HIF1ACYP3A4
Charcoal, Activated SCHEMBL30874262 0.83 TSHR (0.31) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL9312011 0.81 TSHR (0.36) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL2777663 0.81 TSHR (0.32) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL31285604 0.79
SCHEMBL2786089 0.78 TSHR (0.38) TSHR
SCHEMBL9317303 0.78 TSHR (0.40) TSHR
SCHEMBL31285091 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116891661-A Fade Resistant Exterior Paint Formulations 贝洱工艺公司 2023-10-17 CN claimed
CN-115023474-A Primer and finish paint 贝洱工艺公司 2022-09-06 CN claimed
CN-108885394-B Imprint resist and substrate pretreatment for reducing fill time for nanoimprint lithography 佳能株式会社 2022-02-25 CN claimed
US-10273377-B2 Superhydrophobic and oleophobic ceramic polymer composite coating UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) 2019-04-30 US claimed
CN-117736392-A Curable composition for high Wen Guangke-based photopolymerization process and method of preparing crosslinked polymer therefrom 阿莱恩技术有限公司 2024-03-22 CN disclosed
CN-112074262-B Curable composition for high Wen Guangke-based photopolymerization process and method of preparing crosslinked polymer therefrom 阿莱恩技术有限公司 2024-01-16 CN disclosed
CN-116891661-A Fade Resistant Exterior Paint Formulations 贝洱工艺公司 2023-10-17 CN disclosed
CN-113168789-B Optical film with adhesive layer, image display panel, and image display device 日东电工株式会社 2023-07-21 CN disclosed
CN-113196365-B Image display panel with frame and image display device 日东电工株式会社 2023-06-13 CN disclosed
CN-113528053-B Adhesive tape, adhesive tape for fixing electronic device component, and transparent adhesive tape for optical use 积水化学工业株式会社 2022-11-08 CN disclosed
CN-115023474-A Primer and finish paint 贝洱工艺公司 2022-09-06 CN disclosed
CN-110177818-B Polyurethane-based adhesive dispersions 惠普发展公司,有限责任合伙企业 2022-04-08 CN disclosed
US-20130337161-A1 Coating Material Containing Organic/Inorganic Composite, Organic/Inorganic Composite Film and Antireflection Member ASAHI KASEI CHEMICALS CORPORATION (JP) 2013-12-19 US disclosed
EP-2574966-A2 Optical element and method for manufacturing the same Canon Kabushiki Kaisha (JP) 2013-04-03 EP disclosed
US-20120231379-A1 FLUORINE-CONTAINING RESIN PARTICLE DISPERSION, METHOD FOR PREPARING FLUORINE-CONTAINING RESIN PARTICLE DISPERSION, COATING LIQUID WHICH CONTAINS FLUORINE-CONTAINING RESIN PARTICLES, METHOD FOR PREPARING COATING FILM WHICH CONTAINS FLUORINE-CONTAINING RESIN PARTICLES, COATING FILM WHICH CONTAINS FLUORINE-CONTAINING RESIN PARTICLES, MOLDED BODY, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, METHOD FOR PREPARING ELECTROPHOTOGRAPHIC PHOTORECEPTOR, IMAGE FORMING APPARATUS, AND PROCESS CARTRIDGE FUJI XEROX CO., LTD. (JP) 2012-09-13 US disclosed
EP-1723181-A4 TELECHELIC POLYMERS CONTAINING REACTIVE FUNCTIONAL GROUPS PENN STATE RES FOUND (US) 2009-01-21 EP disclosed
US-7416838-B2 Photothermographic material FUJIFILM CORPORATION (JP) 2008-08-26 US disclosed
US-20070207417-A1 Photothermographic material FUJIFILM CORPORATION 2007-09-06 US disclosed
EP-1723181-A1 TELECHELIC POLYMERS CONTAINING REACTIVE FUNCTIONAL GROUPS THE PENN STATE RESEARCH FOUNDATION (US) 2006-11-22 EP disclosed
WO-2005085297-A1 TELECHELIC POLYMERS CONTAINING REACTIVE FUNCTIONAL GROUPS PENN STATE RESEARCH FOUNDATION (US) 2005-09-15 WO disclosed