Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Methyl Alcohol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methyl Alcohol SCHEMBL5577049 | 0.80 | — | — | |
| Methyl Alcohol SCHEMBL6933195 | 0.80 | — | — | |
| Methyl Alcohol SCHEMBL22444363 | 0.80 | — | — | |
| Methyl Alcohol SCHEMBL4101359 | 0.80 | — | — | |
| Methyl Alcohol SCHEMBL3162065 | 0.80 | — | — | |
| Methyl Alcohol SCHEMBL9670890 | 0.80 | — | — | |
| Methyl Alcohol SCHEMBL6925693 | 0.80 | — | — | |
| Methyl Alcohol SCHEMBL368033 | 0.80 | — | — | |
| Methyl Alcohol SCHEMBL20395741 | 0.80 | — | — | |
| Methyl Alcohol SCHEMBL466433 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117618566-A | Nanometer sensitizer loaded with hafnium-bonded heme and preparation and application thereof | 广西医科大学第二附属医院 | 2024-03-01 | — | — | CN | disclosed |
| CN-1953953-B | Metal complex comprising beta-diketonato as ligand | UBE INDUSTRIES | 2010-12-22 | — | — | CN | disclosed |
| US-7595414-B2 | complex capable of being used for chemical vapor deposition of thin metal , or metal oxide films | UBE INDUSTRIES, LTD. (JP) | 2009-09-29 | — | — | US | disclosed |
| US-20080254216-A1 | Metal Complex Compound Comprising B-Diketonato Ligand | UBE INDUSTRIES, LTD. (JP) | 2008-10-16 | — | — | US | disclosed |
| CN-1953953-A | Metal complex comprising beta-diketonato as ligand | UBE INDUSTRIES (JP) | 2007-04-25 | — | — | CN | disclosed |