Charcoal, Activated

Charcoal, Activated

SCHEMBL446584

FC(F)(F)F.[C]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14721708 0.89 — —
SCHEMBL444758 0.89 — —
SCHEMBL24604 0.89 — —
Lithium SCHEMBL1932937 0.80 — —
SCHEMBL11619828 0.80 — —
SCHEMBL729508 0.80 — —
Iodide SCHEMBL1729967 0.80 — —
SCHEMBL1618646 0.80 — —
SCHEMBL2537100 0.80 — —
SCHEMBL1260758 0.80 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 402 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10818508-B2 Semiconductor structure and method for preparing the same NANYA TECHNOLOGY CORPORATION (TW) 2020-10-27 — — US claimed
US-20200126806-A1 SEMICONDUCTOR STRUCTURE AND METHOD FOR PREPARING THE SAME NANYA TECHNOLOGY CORPORATION (TW) 2020-04-23 — — US claimed
US-9419109-B2 Semiconductor device and method for fabricating the same UNITED MICROELECTRONICS CORP. (TW) 2016-08-16 — — US claimed
US-20160118481-A1 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME UNITED MICROELECTRONICS CORP. (TW) 2016-04-28 — — US claimed
EP-0020746-B1 PROCESS AND APPARATUS FOR CLEANING WALL DEPOSITS FROM A FILM DEPOSITION FURNACE TUBE NCR CORPORATION (US) 1983-05-04 — — EP claimed
EP-0020746-A4 PROCESS AND APPARATUS FOR CLEANING WALL DEPOSITS FROM A FILM DEPOSITION FURNACE TUBE. NCR CORP (US) 1981-06-16 — — EP claimed
EP-0020746-A1 PROCESS AND APPARATUS FOR CLEANING WALL DEPOSITS FROM A FILM DEPOSITION FURNACE TUBE. NCR CO (US) 1981-01-07 — — EP claimed
WO-1980001363-A1 LPCVD SYSTEMS HAVING IN SITU PLASMA CLEANING NCR CO (US) 1980-07-10 — — WO claimed
US-20250107291-A1 DISPLAY MODULE AND METHOD FOR FORMING THE SAME AUO Corporation (TW) 2025-03-27 — — US disclosed
US-20240404821-A1 SEMICONDUCTOR SUBSTRATE BEVEL CLEANING LAM RES CORP (US) 2024-12-05 — — US disclosed
US-12068152-B2 Semiconductor substrate bevel cleaning LAM RESEARCH CORPORATION (US) 2024-08-20 — — US disclosed
US-20240107827-A1 DISPLAY PANEL, DISPLAY DEVICE, AND METHOD OF MANUFACTURING DISPLAY PANEL LG DISPLAY CO., LTD. (KR) 2024-03-28 — — US disclosed
US-20240055234-A1 SUBSTRATE PROCESSING APPARATUS PSK INC. (KP) 2024-02-15 — — US disclosed
US-20230338520-A1 Method Of Treating, Reducing, Or Alleviating A Medical Condition In A Patient PEYMAN GHOLAM A (US) 2023-10-26 — — US disclosed
WO-2000033892-A1 A MEDICINAL AEROSOL FORMULATION AEROPHARM TECHNOLOGY INCORPORATED (US) 2000-06-15 — — WO disclosed
WO-2000016814-A1 MEDICINAL AEROSOL FORMULATION AEROPHARM TECHNOLOGY INCORPORATED (US) 2000-03-30 — — WO disclosed
US-5345201-A Saw device and method of manufacture RAYTHEON COMPANY (US) 1994-09-06 — — US disclosed
US-5345134-A Saw device and method of manufacture RAYTHEON COMPANY (US) 1994-09-06 — — US disclosed
US-4289798-A OF RESINOUS COATING ARMSTRONG WORLD INDUSTRIES, INC. (US) 1981-09-15 — — US disclosed
US-4270105-A Stabilized surface wave device RAYTHEON COMPANY (US) 1981-05-26 — — US disclosed
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