⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4467359 | 0.77 | — | — | |
| SCHEMBL1206368 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL10695885 | 0.64 | — | — | |
| SCHEMBL28418615 | 0.64 | HSD17B10 (0.47) | — | |
| Hydroxyl Radical SCHEMBL28108301 | 0.64 | — | — | |
| SCHEMBL23448 | 0.64 | — | — | |
| SCHEMBL296293 | 0.64 | — | — | |
| SCHEMBL7799602 | 0.61 | HSD17B10 (0.45) | — | |
| SCHEMBL12570287 | 0.61 | HSD17B10 (0.45) | — | |
| SCHEMBL116376 | 0.61 | HSD17B10 (0.45) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112526822-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2025-02-28 | — | — | CN | disclosed |
| CN-112286000-B | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-12-03 | — | — | CN | disclosed |
| CN-118620392-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2024-09-10 | — | — | CN | disclosed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| CN-111423587-B | Thermosetting silicon-containing compound, composition for forming silicon-containing film, and method for forming pattern | 信越化学工业株式会社 | 2023-01-31 | — | — | CN | disclosed |
| EP-2111566-A2 | FINE PATTERN TRANSFER MATERIAL | Showa Denko K.K. (JP) | 2009-10-28 | — | — | EP | disclosed |
| WO-2008099903-A2 | FINE PATTERN TRANSFER MATERIAL | SHOWA DENKO K.K. (JP) | 2008-08-21 | — | — | WO | disclosed |