SCHEMBL4467359

SCHEMBL4467359

CCCCO[Ge]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4466514 0.77
SCHEMBL124126 0.69 ADRB2 (0.53)
SCHEMBL28748446 0.69 TSHR (0.71)
SCHEMBL439119 0.69 TSHR (0.71)
SCHEMBL8600029 0.69 TSHR (0.71)
SCHEMBL15167 0.69
SCHEMBL5454955 0.67 TSHR (0.67)
SCHEMBL1133315 0.67 TSHR (0.67)
SCHEMBL4324369 0.67 TSHR (0.67)
Fluoride SCHEMBL22775990 0.67 TSHR (0.67)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114930208-B Retardation film and use thereof 大阪燃气化学有限公司 2025-02-07 CN disclosed
CN-113727961-B Dicarboxylic acids, process for producing the same, and use thereof 大阪燃气化学有限公司 2024-09-03 CN disclosed
CN-115956067-A Method for producing carbamate, and method for producing urea derivative 国立研究开发法人产业技术总合研究所 2023-04-11 CN disclosed
CN-111423587-B Thermosetting silicon-containing compound, composition for forming silicon-containing film, and method for forming pattern 信越化学工业株式会社 2023-01-31 CN disclosed
CN-101606101-B Fine pattern transfer material SHOWA DENKO KK 2012-11-21 CN disclosed
CN-101606101-A Fine pattern transfer material SHOWA DENKO KK (JP) 2009-12-16 CN disclosed
EP-2111566-A2 FINE PATTERN TRANSFER MATERIAL Showa Denko K.K. (JP) 2009-10-28 EP disclosed
WO-2008099903-A2 FINE PATTERN TRANSFER MATERIAL SHOWA DENKO K.K. (JP) 2008-08-21 WO disclosed