Acetic Acid Butyl Ester

Acetic Acid Butyl Ester

SCHEMBL446697

CCCC.CCCCOC(C)=O.CCOCC.OCCO

nearest known ligand 0.69

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.69
TSHR P16473 6/20 0.55
ATM Q13315 1/20 0.44
LMNA P02545 1/20 0.43
HSD17B10 Q99714 1/20 0.43
HPGD P15428 1/20 0.41
HCAR2 Q8TDS4 1/20 0.39
ACHE P22303 7/20 0.39
NAAA Q02083 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid Butyl Ester SCHEMBL21930789 0.98 ALDH1A1 (0.72) ALDH1A1TSHRATMLMNAHSD17B10
Acetic Acid Butyl Ester SCHEMBL23847 0.98 ALDH1A1 (0.72) ALDH1A1TSHRATMLMNAHSD17B10
Acetic Acid Butyl Ester SCHEMBL99360 0.94 ALDH1A1 (0.67) ALDH1A1TSHRATMLMNAHSD17B10
Acetic Acid Butyl Ester SCHEMBL3830941 0.94 ALDH1A1 (0.67) ALDH1A1TSHRATMLMNAHSD17B10
Acetic Acid Butyl Ester SCHEMBL11586521 0.94 ALDH1A1 (0.67) ALDH1A1TSHRATMLMNAHSD17B10
Acetic Acid Butyl Ester SCHEMBL4332270 0.92 ALDH1A1 (0.69) ALDH1A1TSHRATMLMNAHSD17B10
Acetic Acid Pentyl Ester SCHEMBL6435683 0.92 ALDH1A1 (0.63) ALDH1A1TSHRLMNAHSD17B10HCAR2
Acetic Acid Butyl Ester SCHEMBL4318088 0.92 ALDH1A1 (0.69) ALDH1A1TSHRATMLMNAHSD17B10
Acetic Acid Butyl Ester SCHEMBL598803 0.92 ALDH1A1 (0.82) ALDH1A1TSHRATMLMNAHSD17B10
Acetic Acid Butyl Ester SCHEMBL37244 0.92 ALDH1A1 (0.82) ALDH1A1TSHRATMLMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828877-B2 Etching solution and trench isolation structure-formation process employing the same AZ ELECTRONIC MATERIALS USA CORP. (US) 2014-09-09 US claimed
EP-2898008-B1 PROCESS FOR EXTRACTING POLYESTER FROM AN ARTICLE WORN AGAIN FOOTWEAR AND ACCESSORIES LTD (GB) 2018-04-18 EP disclosed
US-9885956-B2 Pattern forming method, and, electronic device producing method and electronic device, each using the same FUJIFILM CORPORATION (JP) 2018-02-06 US disclosed
EP-2891014-B1 PATTERN FORMING METHOD, AND ELECTRONIC DEVICE PRODUCING METHOD USING THE SAME FUJIFILM CORP (JP) 2017-11-29 EP disclosed
EP-2437283-B1 METHOD FOR FORMING TRENCH ISOLATION STRUCTURE MERCK PATENT GMBH (DE) 2017-09-20 EP disclosed
US-9611371-B2 Process for extracting polyester from an article WORN AGAIN FOOTWEAR AND ACCESSORIES, LIMITED (GB) 2017-04-04 US disclosed
US-20150232632-A1 Process for Extracting Polyester from an Article WORN AGAIN FOOTWEAR AND ACCESSORIES LIMITED (GB) 2015-08-20 US disclosed
EP-2898008-A1 PROCESS FOR EXTRACTING POLYESTER FROM AN ARTICLE Worn Again Footwear And Accessories Limited (GB) 2015-07-29 EP disclosed
EP-2891014-A1 PATTERN FORMING METHOD, AND, ELECTRONIC DEVICE PRODUCING METHOD AND ELECTRONIC DEVICE, EACH USING THE SAME FUJIFILM Corporation (JP) 2015-07-08 EP disclosed
US-20150140482-A1 PATTERN FORMING METHOD, AND, ELECTRONIC DEVICE PRODUCING METHOD AND ELECTRONIC DEVICE, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2015-05-21 US disclosed
US-8828877-B2 Etching solution and trench isolation structure-formation process employing the same AZ ELECTRONIC MATERIALS USA CORP. (US) 2014-09-09 US disclosed
WO-2014045062-A1 PROCESS FOR EXTRACTING POLYESTER FROM AN ARTICLE WORN AGAIN FOOTWEAR AND ACCESSORIES LIMITED (GB) 2014-03-27 WO disclosed
WO-2014034578-A1 PATTERN FORMING METHOD, AND, ELECTRONIC DEVICE PRODUCING METHOD AND ELECTRONIC DEVICE, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2014-03-06 WO disclosed
US-20120064722-A1 ETCHING SOLUTION AND TRENCH ISOLATION STRUCTURE-FORMATION PROCESS EMPOLYING THE SAME AZ ELECTRONIC MATERIALS USA CORP. (US) 2012-03-15 US disclosed
EP-1925952-A1 Filter substrate for a display device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2008-05-28 EP disclosed
EP-1760499-A1 Glass substrate for a display filter Nippon Sheet Glass Company, Limited (JP) 2007-03-07 EP disclosed
EP-1320260-A1 DISPLAY FILTER SUBSTRATE, AND DISPLAY DEVICE Nippon Sheet Glass Co., Ltd. (JP) 2003-06-18 EP disclosed
US-6472800-B2 Filter substrate and display device NIPPON SHEET GLASS CO., LTD. (JP) 2002-10-29 US disclosed
US-20020135281-A1 Filter substrate and display device NIPPON SHEET GLASS CO., LTD. 2002-09-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150232632-A1 Process for Extracting Polyester from an Article C9, ALKBH3, DRD4 ALDH1A1 1909/4885TSHR 3511/4885ATM 1714/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.