SCHEMBL4469766

SCHEMBL4469766

CC(C)(C)c1cc(CCC(=O)OCCN2C(C)(C)CCCC2(C)C)cc(C(C)(C)C)c1O

nearest known ligand 0.52

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
GAA P10253 5/20 0.43
KMT2A Q03164 2/20 0.42
MEN1 O00255 1/20 0.42
PKM P14618 1/20 0.39
HTT P42858 1/20 0.39
ALDH1A1 P00352 3/20 0.37
KDM4E B2RXH2 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
MAPT P10636 1/20 0.37
MAOB P27338 3/20 0.37
MAOA P21397 2/20 0.37
ALOX5 P09917 1/20 0.37
ACHE P22303 1/20 0.35
LMNA P02545 1/20 0.35
POLB P06746 1/20 0.35
THRB P10828 1/20 0.35
HPGD P15428 1/20 0.35
TSHR P16473 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22150256 0.89 GAA (0.43) GAAKMT2AMEN1PKMHTT
SCHEMBL206978 0.86 KMT2A (0.43) GAAKMT2AMEN1PKMHTT
SCHEMBL27388732 0.86 GAA (0.41) GAAKMT2AMEN1PKMHTT
SCHEMBL28146882 0.85 GAA (0.38) GAAKMT2AMEN1PKMHTT
SCHEMBL4183573 0.85 KMT2A (0.42) GAAKMT2AMEN1PKMHTT
SCHEMBL9180631 0.85 KMT2A (0.42) GAAKMT2AMEN1PKMHTT
SCHEMBL8377516 0.84 KMT2A (0.39) GAAKMT2AMEN1PKMHTT
SCHEMBL28653455 0.84 MAOB (0.32) GAAKMT2AMEN1MAOBMAOA
SCHEMBL9813628 0.83 KMT2A (0.43) GAAKMT2AMEN1PKMHTT
Cyclohexane SCHEMBL676099 0.83 GAA (0.56) GAAKMT2AMEN1PKMHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025089385-A1 INK COMPOSITION 大日本塗料株式会社 2025-05-01 WO disclosed
WO-2022210740-A1 INK COMPOSITION FOR FORMING SURFACE-PROTECTING LAYERS 大日本塗料株式会社 2022-10-06 WO disclosed
CN-104816522-B Pioloform, polyvinyl acetal based resin film and the multilayer structure making for having used it 株式会社可乐丽 2017-09-15 CN disclosed
US-20140296415-A1 Method for forming cured product from photocurable composition and cured product SEIKO EPSON CORPORATION (JP) 2014-10-02 US disclosed
US-20090093564-A1 Method for forming cured product from photocurable composition and cured product SEIKO EPSON CORPORATION (JP) 2009-04-09 US disclosed
US-3975357-A SUBSTITUTED PIPERIDINES SANKYO COMPANY LIMITED (JA) 1976-08-17 US disclosed