Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Trientine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 5/20 | 0.55 |
| ▸ | CA6 | P23280 | 5/20 | 0.55 |
| ▸ | CA7 | P43166 | 5/20 | 0.55 |
| ▸ | CA9 | Q16790 | 5/20 | 0.55 |
| ▸ | CA14 | Q9ULX7 | 5/20 | 0.55 |
| ▸ | CA5B | Q9Y2D0 | 5/20 | 0.55 |
| ▸ | CA1 | P00915 | 4/20 | 0.55 |
| ▸ | CA2 | P00918 | 4/20 | 0.55 |
| ▸ | CA4 | P22748 | 4/20 | 0.55 |
| ▸ | CA5A | P35218 | 4/20 | 0.55 |
| ▸ | CA3 | P07451 | 3/20 | 0.55 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.55 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.55 |
| ▸ | TP53 | P04637 | 1/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.52 |
| ▸ | MEN1 | O00255 | 2/20 | 0.50 |
| ▸ | RECQL | P46063 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trientine SCHEMBL28476782 | 1.00 | CA12 (0.55) | CA12CA6CA7CA9CA14 | |
| Trientine SCHEMBL19915236 | 0.98 | CA12 (0.52) | CA12CA6CA7CA9CA14 | |
| Acetic Acid SCHEMBL155357 | 0.97 | CA12 (0.53) | CA12CA6CA7CA9CA14 | |
| Acetic Acid SCHEMBL9568670 | 0.97 | CA12 (0.53) | CA12CA6CA7CA9CA14 | |
| Acetic Acid SCHEMBL9110421 | 0.97 | CA12 (0.53) | CA12CA6CA7CA9CA14 | |
| Acetic Acid SCHEMBL29259811 | 0.97 | CA12 (0.53) | CA12CA6CA7CA9CA14 | |
| Acetic Acid SCHEMBL3858553 | 0.95 | CA12 (0.50) | CA12CA6CA7CA9CA14 | |
| Trientine SCHEMBL11474495 | 0.95 | CA12 (0.55) | CA12CA6CA7CA9CA14 | |
| Acetic Acid SCHEMBL9267542 | 0.95 | CA12 (0.50) | CA12CA6CA7CA9CA14 | |
| Acetic Acid SCHEMBL9128649 | 0.95 | CA12 (0.50) | CA12CA6CA7CA9CA14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240065962-A1 | COSMETIC PREPARATION | SHISEIDO COMPANY, LTD. (JP) | 2024-02-29 | — | — | US | claimed |
| EP-4292582-A1 | COSMETIC PREPARATION | Shiseido Company, Ltd. (JP) | 2023-12-20 | — | — | EP | claimed |
| CN-116782867-A | Cosmetic material | 株式会社资生堂 | 2023-09-19 | — | — | CN | claimed |
| WO-2022172790-A1 | COSMETIC PREPARATION | 株式会社 資生堂 | 2022-08-18 | — | — | WO | claimed |
| US-12584083-B2 | Surface treatment composition, surface treatment method, and method for producing semiconductor substrate | FUJIMI INCORPORATED (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4693374-A1 | METHOD FOR PRODUCING POLISHING COMPOSITION | Fujimi Incorporated (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4693373-A1 | POLISHING AND WASHING METHOD, WASHING AGENT, AND SET OF POLISHING COMPOSITION AND WASHING AGENT | Fujimi Incorporated (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-12516276-B2 | Surface treatment composition | FUJIMI INCORPORATED (JP) | 2026-01-06 | — | — | US | disclosed |
| US-12404475-B2 | Surface treatment composition, surface treatment method, and method for producing semiconductor substrate | FUJIMI INCORPORATED (JP) | 2025-09-02 | — | — | US | disclosed |
| EP-4567863-A1 | POLISHING COMPOSITION | Fujimi Incorporated (JP) | 2025-06-11 | — | — | EP | disclosed |
| US-12305081-B2 | Polishing composition | JAPAN VAM & POVAL CO., LTD. (JP) | 2025-05-20 | — | — | US | disclosed |
| EP-2960314-B1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | FUJIMI INC (JP) | 2024-06-26 | — | — | EP | disclosed |
| EP-2977423-A1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, AND KIT FOR PREPARING POLISHING COMPOSITION | Fujimi Incorporated (JP) | 2016-01-27 | — | — | EP | disclosed |
| US-20160001416-A1 | POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INCORPORATED (JP) | 2016-01-07 | — | — | US | disclosed |
| US-20150376464-A1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INCORPORATED (JP) | 2015-12-31 | — | — | US | disclosed |
| EP-2960314-A1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-30 | — | — | EP | disclosed |
| EP-2957613-A1 | POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE | Fujimi Incorporated (JP) | 2015-12-23 | — | — | EP | disclosed |
| US-9028709-B2 | Surface treatment composition and surface treatment method using same | FUJIMI INCORPORATED (JP) | 2015-05-12 | — | — | US | disclosed |
| US-20130181159-A1 | SURFACE TREATMENT COMPOSITION AND SURFACE TREATMENT METHOD USING SAME | FUJIMI INCORPORATED | 2013-07-18 | — | — | US | disclosed |
| US-20090226833-A1 | ELECTROPHOTOGRAPHIC TONER, METHOD FOR MANUFACTURING THE SAME, ELECTROPHOTOGRAPHIC DEVELOPING AGENT, TONER CARTRIDGE, PROCESS CARTRIDGE AND IMAGE FORMING APPARATUS | FUJI XEROX CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12584083-B2 | Surface treatment composition, surface treatment method, and method for producing semiconductor substrate | PIEZO1, TYRO3, ACP1 | CA12 839/4885CA6 2041/4885CA7 770/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.