SCHEMBL447451

SCHEMBL447451

CCC(N)(CN)c1ccccc1CC[Si](OC)(OC)OC

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21060573 0.87
SCHEMBL21060583 0.85
SCHEMBL21060550 0.85
SCHEMBL37758 0.84 TAAR1 (0.34) TAAR1
SCHEMBL16597963 0.80 TAAR1 (0.36) TAAR1
SCHEMBL20210791 0.75 TAAR1 (0.33) TAAR1
SCHEMBL139732 0.74 TAAR1 (0.42) TAAR1
SCHEMBL30276868 0.74 TAAR1 (0.42) TAAR1
SCHEMBL21060563 0.73
SCHEMBL6332009 0.71 MTNR1A (0.41) TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4869964-A Oxidation resistant compositions for use with rare earth magnets THE B. F. GOODRICH COMPANY (US) 1989-09-26 US claimed
WO-2025005084-A1 SUBSTRATE LAMINATE 三井化学株式会社 2025-01-02 WO disclosed
WO-2024172044-A1 METHOD FOR MANUFACTURING SUBSTRATE LAYERED BODY, LAYERED BODY, AND SUBSTRATE LAYERED BODY 三井化学株式会社 2024-08-22 WO disclosed
WO-2024162446-A1 SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SAME 三井化学株式会社 2024-08-08 WO disclosed
US-11965109-B2 Semiconductor film composition, method for manufacturing semiconductor film composition, method for manufacturing semiconductor member, method for manufacturing semiconductor processing material, and semiconductor device MITSUI CHEMICALS, INC. (JP) 2024-04-23 US disclosed
WO-2024029390-A1 METHOD FOR PRODUCING SUBSTRATE LAMINATE AND SEMICONDUCTOR DEVICE 三井化学株式会社 2024-02-08 WO disclosed
US-20240026219-A1 LIGHT-EMITTING PARTICLES AND METHOD FOR PRODUCING THE SAME, LIGHT-EMITTING PARTICLE DISPERSION, LIGHT CONVERSION FILM, LAMINATE, LIGHT CONVERSION LAYER, COLOR FILTER, AND LIGHT-EMITTING ELEMENT DIC CORPORATION (JP) 2024-01-25 US disclosed
WO-2024010007-A1 SUBSTRATE LAYERED BODY MANUFACTURING METHOD AND SUBSTRATE LAYERED BODY 三井化学株式会社 2024-01-11 WO disclosed
US-11859110-B2 Substrate laminated body and method of manufacturing substrate laminated body MITSUI CHEMICALS, INC. (JP) 2024-01-02 US disclosed
EP-4249569-A1 LUMINESCENT PARTICLES AND PRODUCTION METHOD THEREFOR, LUMINESCENT-PARTICLE DISPERSION, PHOTOCONVERSION FILM, LAYERED PRODUCT, PHOTOCONVERSION LAYER, COLOR FILTER, AND LUMINESCENT ELEMENT DIC Corporation (JP) 2023-09-27 EP disclosed
EP-2614118-B1 SILICON DIOXIDE DISPERSIONS BASF SE (DE) 2015-11-25 EP disclosed
US-8901186-B2 Process for producing silica-comprising dispersions comprising polyetherols or polyether amines BASF SE (DE) 2014-12-02 US disclosed
EP-2614118-A1 SILICON DIOXIDE DISPERSIONS BASF SE (DE) 2013-07-17 EP disclosed
EP-2337806-B1 METHOD FOR PRODUCING POLYOL DISPERSIONS CONTAINING SILICA BASF SE (DE) 2013-03-27 EP disclosed
US-20120065341-A1 SILICON DIOXIDE DISPERSIONS BASF SE (DE) 2012-03-15 US disclosed
WO-2012032099-A1 SILICON DIOXIDE DISPERSIONS BASF SE (DE) 2012-03-15 WO disclosed
US-20110313070-A1 PROCESS FOR PRODUCING SILICA-COMPRISING DISPERSIONS COMPRISING POLYETHEROLS OR POLYETHER AMINES BASF SE (DE) 2011-12-22 US disclosed
US-20110266497-A1 PROCESS FOR PRODUCING SILICA-COMPRISING POLYOL DISPERSIONS AND THEIR USE FOR PRODUCING POLYURETHANE MATERIALS BASF SE (DE) 2011-11-03 US disclosed
US-20060004121-A1 Polymer-brush modified fillers for composites REGENTS OF THE UNIVERSITY OF COLORADO, THE 2006-01-05 US disclosed
US-4689422-A Novel ligand catalyst systems formed by reaction of carbonyl compounds with organosilicon compounds TEXACO INC. (US) 1987-08-25 US disclosed