SCHEMBL4496391

SCHEMBL4496391

COc1ccc(C=CC#N)cc1OC

nearest known ligand 0.79

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ FDPS P14324 1/20 0.79
▸ CYP1A1 P04798 7/20 0.58
▸ CYP1B1 Q16678 6/20 0.58
▸ CYP1A2 P05177 3/20 0.58
▸ TUBB4A P04350 1/20 0.58
▸ TUBB P07437 1/20 0.58
▸ TUBA3C P0DPH7 1/20 0.58
▸ TUBA1B P68363 1/20 0.58
▸ TUBA4A P68366 1/20 0.58
▸ TUBB4B P68371 1/20 0.58
▸ TUBB3 Q13509 1/20 0.58
▸ TUBB2A Q13885 1/20 0.58
▸ TUBB8 Q3ZCM7 1/20 0.58
▸ TUBA3E Q6PEY2 1/20 0.58
▸ TUBA1A Q71U36 1/20 0.58
▸ TUBA1C Q9BQE3 1/20 0.58
▸ TUBB6 Q9BUF5 1/20 0.58
▸ TUBB2B Q9BVA1 1/20 0.58
▸ TUBB1 Q9H4B7 1/20 0.58
▸ NQO2 P16083 4/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4496389 1.00 FDPS (0.79) FDPSCYP1A1CYP1B1CYP1A2TUBB4A
Hydrochloric Acid SCHEMBL27720316 0.98 FDPS (0.77) FDPSCYP1A1CYP1B1CYP1A2TUBB4A
Pyridine SCHEMBL27699647 0.88 FDPS (0.63) FDPSCYP1A1CYP1B1CYP1A2TUBB4A
SCHEMBL4825864 0.87 FDPS (0.71) FDPSTUBB1MAPTKDM4E
SCHEMBL4825866 0.87 FDPS (0.71) FDPSTUBB1MAPTKDM4E
Pyridine SCHEMBL27699688 0.87 FDPS (0.62) FDPSCYP1A1CYP1B1CYP1A2TUBB4A
SCHEMBL4214931 0.86 FDPS (0.65) FDPSCYP1A1CYP1B1CYP1A2TUBB4A
SCHEMBL4214927 0.86 FDPS (0.65) FDPSCYP1A1CYP1B1CYP1A2TUBB4A
SCHEMBL12715636 0.84 FDPS (0.63) FDPSTUBB4ATUBBTUBA3CTUBA1B
SCHEMBL14413750 0.84 FDPS (0.63) FDPSCYP1A1CYP1B1CYP1A2TUBB4A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116102457-B Method for preparing 3, 4-dimethoxy cinnamonitrile and analogues thereof from lignin and model compounds thereof 中国科学院大连化学物理研究所 2024-10-22 — — CN claimed
CN-116102457-A Method for preparing 3, 4-dimethoxy cinnamonitrile and analogues thereof from lignin and model compounds thereof 中国科学院大连化学物理研究所 2023-05-12 — — CN claimed
EP-3240047-B1 PHOTOSENSITIVE COMPOSITION COMPRISING SEMICONDUCTOR NANOCRYSTALS AND METHOD FOR FORMING SEMICONDUCTOR NANOCRYSTAL PATTERN USING THE SAME SAMSUNG ELECTRONICS CO LTD (KR) 2022-07-06 — — EP claimed
EP-3240047-A1 PHOTOSENSITIVE SEMICONDUCTOR NANOCRYSTALS, PHOTOSENSITIVE COMPOSITION COMPRISING SEMICONDUCTOR NANOCRYSTALS AND METHOD FOR FORMING SEMICONDUCTOR NANOCRYSTAL PATTERN USING THE SAME Samsung Electronics Co., Ltd. (KR) 2017-11-01 — — EP claimed
EP-1526584-B1 Method of forming electroluminescent semiconducting nanocrystal patterned layer for an organic-inorganic hybrid electroluminescent devices, and organic-inorganic hybrid electroluminescent device using the same. SAMSUNG ELECTRONICS CO LTD (KR) 2017-06-14 — — EP claimed
US-8911883-B2 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-12-16 — — US claimed
US-8758864-B2 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-06-24 — — US claimed
US-20130011635-A1 PHOTOSENSITIVE SEMICONDUCTOR NANOCRYSTALS, PHOTOSENSITIVE COMPOSITION COMPRISING SEMICONDUCTOR NANOCRYSTALS AND METHOD FOR FORMING SEMICONDUCTOR NANOCRYSTAL PATTERN USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-01-10 — — US claimed
CN-1655057-B Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and uses thereof SAMSUNG ELECTRONICS CO LTD 2010-12-08 — — CN claimed
US-7476487-B2 Inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group is used for photolithographic process to form a pattern; curable with a curing agents; photomasking; simple method; organic-inorganic hybrid electroluminescent devices SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-01-13 — — US claimed
US-20080290797-A1 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-11-27 — — US claimed
US-7199393-B2 Photolithographic process to form a pattern, using an inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group; photomasking; simple method; organic-inorganic hybrid electroluminescent devices SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-04-03 — — US claimed
US-20060199039-A1 Inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group is used for photolithographic process to form a pattern; curable with a curing agents; photomasking; simple method; organic-inorganic hybrid electroluminescent devices SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-09-07 — — US claimed
CN-1655057-A Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and uses thereof SAMSUNG ELECTRONICS CO LTD (KR) 2005-08-17 — — CN claimed
US-20050161666-A1 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-07-28 — — US claimed
EP-1526584-A2 Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same Samsung Electronics Co., Ltd (KR) 2005-04-27 — — EP claimed
US-20040261198-A1 Restructuring and finishing of keratin fibers HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) (DE) 2004-12-30 — — US claimed
JP-63150223-A — — None — — JP disclosed
WO-1996039391-A1 STYRYL BENZIMIDAZOLE DERIVATIVES AS INHIBITORS OF SMOOTH MUSCLE CELL PROLIFERATION AMERICAN HOME PRODUCTS CORPORATION (US) 1996-12-12 — — WO disclosed
JP-S63150223-A CARDIOTONIC AGENT KANEGAFUCHI CHEM IND CO LTD 1988-06-22 — — JP disclosed
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