⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9310514 | 0.82 | — | — | |
| SCHEMBL16819035 | 0.79 | — | — | |
| SCHEMBL7752000 | 0.73 | — | — | |
| SCHEMBL5888526 | 0.73 | — | — | |
| SCHEMBL12004927 | 0.72 | — | — | |
| SCHEMBL5074142 | 0.71 | — | — | |
| SCHEMBL8090434 | 0.71 | — | — | |
| SCHEMBL1309581 | 0.68 | — | — | |
| SCHEMBL8090475 | 0.67 | — | — | |
| SCHEMBL9134638 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9536940-B2 | Interfacial materials for use in semiconductor structures and related methods | MICRON TECHNOLOGY, INC. (US) | 2017-01-03 | — | — | US | claimed |
| US-20140161706-A1 | METHOD AND APPARATUS OF FORMING METAL COMPOUND FILM, AND ELECTRONIC PRODUCT | TOKYO ELECTRON LIMITED (JP) | 2014-06-12 | — | — | US | claimed |
| US-8735304-B2 | Film forming method, film forming apparatus, and storage medium | ELPIDA MEMORY INC. (JP) | 2014-05-27 | — | — | US | claimed |
| US-8642127-B2 | Method of forming titanium nitride film | TOKYO ELECTRON LIMITED (JP) | 2014-02-04 | — | — | US | claimed |
| US-8288241-B2 | Semiconductor device, method of manufacturing the same and adsorption site blocking atomic layer deposition method | ELPIDA MEMORY, INC. (JP) | 2012-10-16 | — | — | US | claimed |
| US-20120244721-A1 | FILM FORMING METHOD, FILM FORMING APPARATUS, AND STORAGE MEDIUM | TOKYO ELECTRON LIMITED (JP) | 2012-09-27 | — | — | US | claimed |
| US-20120219710-A1 | METHOD OF FORMING TITANIUM NITRIDE FILM, APPARATUS FOR FORMING TITANIUM NITRIDE FILM, AND PROGRAM | TOKYO ELECTRON LIMITED (JP) | 2012-08-30 | — | — | US | claimed |
| US-20120077322-A1 | SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME AND ADSORPTION SITE BLOCKING ATOMIC LAYER DEPOSITION METHOD | TOKYO ELECTRON LIMITED (JP) | 2012-03-29 | — | — | US | claimed |
| EP-3178808-B1 | ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM FORMATION METHOD AND ALCOHOL COMPOUND | ADEKA CORP (JP) | 2024-11-06 | — | — | EP | disclosed |
| US-20230159561-A1 | HETEROCYCLE-SUBSTITUTED BICYCLIC AZOLE PESTICIDES | FMC CORP (US) | 2023-05-25 | — | — | US | disclosed |
| US-11618762-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | ADEKA CORPORATION (JP) | 2023-04-04 | — | — | US | disclosed |
| US-11578085-B2 | Heterocycle-substituted bicyclic azole pesticides | FMC CORPORATION (US) | 2023-02-14 | — | — | US | disclosed |
| US-20220017554-A1 | COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND AMIDINE COMPOUND | ADEKA CORPORATION (JP) | 2022-01-20 | — | — | US | disclosed |
| US-11161867-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | ADEKA CORPORATION (JP) | 2021-11-02 | — | — | US | disclosed |
| CN-102655085-A | Method of forming titanium nitride film, apparatus for forming titanium nitride film, and program | TOKYO ELECTRON LTD | 2012-09-05 | — | — | CN | disclosed |
| US-20120219710-A1 | METHOD OF FORMING TITANIUM NITRIDE FILM, APPARATUS FOR FORMING TITANIUM NITRIDE FILM, AND PROGRAM | TOKYO ELECTRON LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219710-A1 | METHOD OF FORMING TITANIUM NITRIDE FILM, APPARATUS FOR FORMING TITANIUM NITRIDE FILM, AND PROGRAM | TOKYO ELECTRON LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120077322-A1 | SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME AND ADSORPTION SITE BLOCKING ATOMIC LAYER DEPOSITION METHOD | TOKYO ELECTRON LIMITED (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120064689-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | ELPIDA MEMORY, INC. (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120065233-A1 | TYROSINE KINASE INHIBITORS | GREGOR VLAD EDWARD (US) | 2012-03-15 | — | — | US | disclosed |