Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 4/20 | 0.37 |
| ▸ | NAAA | Q02083 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | CYP17A1 | P05093 | 3/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1821534 | 0.87 | CYP19A1 (0.35) | CYP19A1NAAANPSR1TSHRALDH1A1 | |
| SCHEMBL28074611 | 0.87 | CYP19A1 (0.37) | CYP19A1NAAANPSR1TSHRALDH1A1 | |
| SCHEMBL5893934 | 0.84 | EPHX2 (0.37) | CYP19A1NAAAALDH1A1CYP17A1EPHX2 | |
| SCHEMBL8533098 | 0.84 | CYP19A1 (0.32) | CYP19A1NAAANPSR1TSHRALDH1A1 | |
| SCHEMBL27564421 | 0.84 | NPSR1 (0.36) | CYP19A1NAAANPSR1TSHRALDH1A1 | |
| SCHEMBL12003304 | 0.83 | CYP19A1 (0.38) | CYP19A1NAAANPSR1TSHRALDH1A1 | |
| SCHEMBL242186 | 0.82 | NAAA (0.39) | CYP19A1NAAANPSR1TSHRALDH1A1 | |
| SCHEMBL29117892 | 0.82 | CYP19A1 (0.36) | CYP19A1NAAANPSR1TSHRALDH1A1 | |
| SCHEMBL1271394 | 0.81 | NAAA (0.38) | CYP19A1NAAANPSR1ALDH1A1CYP17A1 | |
| SCHEMBL1825318 | 0.78 | EPHX2 (0.40) | CYP19A1NPSR1TSHRALDH1A1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200135454-A1 | METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND A COATING MATERIAL | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-04-30 | — | — | US | claimed |
| US-20190164746-A1 | METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND A COATING MATERIAL | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2019-05-30 | — | — | US | claimed |
| WO-2013190406-A1 | ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-27 | — | — | WO | claimed |
| US-20130344441-A1 | ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-26 | — | — | US | claimed |
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | claimed |
| US-20060247400-A1 | Photoresist compositions and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-11-02 | — | — | US | claimed |
| US-20060121390-A1 | High resolution resists for next generation lithographies | NATIONAL SCIENCE FOUNDATION | 2006-06-08 | — | — | US | claimed |
| CN-118339251-A | Release agent, adhesive composition, laminate, and method for producing semiconductor substrate | 日产化学株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-116981758-A | Thermally responsive brush polymers having a copolymer backbone and copolymer arms | 英菲诺姆国际有限公司 | 2023-10-31 | — | — | CN | disclosed |
| CN-116410089-A | Photoresist film-forming monomer and preparation method and application thereof | 安庆北化大科技园有限公司 | 2023-07-11 | — | — | CN | disclosed |
| CN-115668464-A | Composition for forming upper layer film and method for producing phase separation pattern | 日产化学株式会社 | 2023-01-31 | — | — | CN | disclosed |
| CN-110730790-B | Fluorine-containing monomer, fluorine-containing polymer, composition for forming pattern using same, and method for forming pattern using same | 中央硝子株式会社 | 2021-06-15 | — | — | CN | disclosed |
| US-20200135454-A1 | METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND A COATING MATERIAL | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-04-30 | — | — | US | disclosed |
| WO-2006091375-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2006-08-31 | — | — | WO | disclosed |
| WO-2005061590-A1 | POLYMER PURIFICATION | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2005-07-07 | — | — | WO | disclosed |
| EP-1497341-A1 | PREPARATION OF HOMO-, CO- AND TERPOLYMERS OF SUBSTITUTED STYRENES | Dupont Electronic Technologies L.P. (US) | 2005-01-19 | — | — | EP | disclosed |
| EP-1497339-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | Dupont Electronic Technologies L.P. (US) | 2005-01-19 | — | — | EP | disclosed |
| EP-1479700-A1 | Processes for preparing photoresist compositions | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2004-11-24 | — | — | EP | disclosed |
| WO-2003089482-A1 | PREPARATION OF HOMO-, CO- AND TERPOLYMERS OF SUBSTITUTED STYRENES | DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) | 2003-10-30 | — | — | WO | disclosed |
| WO-2003089480-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) | 2003-10-30 | — | — | WO | disclosed |