SCHEMBL4518237

SCHEMBL4518237

CCC[Si](OC)(OC)OC.CCO[Si](CC)(OCC)OCC

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6046634 0.90 LMNA (0.38) LMNA
SCHEMBL1609567 0.87 LMNA (0.34) LMNA
SCHEMBL8001019 0.87
SCHEMBL2034096 0.87 LMNA (0.34) LMNA
SCHEMBL5961060 0.86 LMNA (0.46) LMNA
SCHEMBL2848992 0.85
SCHEMBL1608631 0.82
SCHEMBL5898814 0.82
SCHEMBL35169 0.82 LMNA (0.44) LMNA
SCHEMBL8130395 0.82 LMNA (0.44) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210002302-A1 MAGNESIUM COMPOUND, METHOD FOR PRODUCING THE SAME AND USE THEREOF SCG CHEMICALS CO., LTD. (TH) 2021-01-07 US disclosed
US-10600680-B2 Chemoepitaxy etch trim using a self aligned hard mask for metal line to via INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2020-03-24 US disclosed
EP-3489244-A1 MAGNESIUM COMPOUND, METHOD FOR PRODUCING THE SAME AND USE THEREOF Scg Chemicals Co. Ltd. (TH) 2019-05-29 EP disclosed
US-10256139-B2 Chemoepitaxy etch trim using a self aligned hard mask for metal line to via INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2019-04-09 US disclosed
US-20190043754-A1 CHEMOEPITAXY ETCH TRIM USING A SELF ALIGNED HARD MASK FOR METAL LINE TO VIA INTERNATIONAL BUSINESS MACHINES CORPORATION 2019-02-07 US disclosed
US-10059820-B2 Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2018-08-28 US disclosed
US-10037398-B2 Pattern decomposition method for wiring patterns with chemoepitaxy based directed self assembly INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2018-07-31 US disclosed
US-9982097-B2 Thin film self assembly of topcoat-free silicon-containing diblock copolymers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2018-05-29 US disclosed
US-9879152-B2 Block copolymers for directed self-assembly applications INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2018-01-30 US disclosed
US-20170344691-A1 PATTERN DECOMPOSITION METHOD FOR WIRING PATTERNS WITH CHEMOEPITAXY BASED DIRECTED SELF ASSEMBLY GOVERNMENT OF THE UNITED STATES AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE 2017-11-30 US disclosed
WO-2016132248-A1 HYBRID TOPOGRAPHICAL AND CHEMICAL PRE-PATTERNS FOR DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2016-08-25 WO disclosed
US-20160244581-A1 HYBRID TOPOGRAPHICAL AND CHEMICAL PRE-PATTERNS FOR DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS INTERNATIONAL BUSINESS MACHINES CORPORATION 2016-08-25 US disclosed
US-9159558-B2 Methods of reducing defects in directed self-assembled structures INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-10-13 US disclosed
US-9107291-B2 Formation of a composite pattern including a periodic pattern self-aligned to a prepattern INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-08-11 US disclosed
US-20150195916-A1 FORMATION OF A COMPOSITE PATTERN INCLUDING A PERIODIC PATTERN SELF-ALIGNED TO A PREPATTERN INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-07-09 US disclosed
US-20140273476-A1 METHODS OF REDUCING DEFECTS IN DIRECTED SELF-ASSEMBLED STRUCTURES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-09-18 US disclosed
WO-2014120320-A2 FORMATION OF A COMPOSITE PATTERN INCLUDING A PERIODIC PATTERN SELF-ALIGNED TO A PREPATTERN INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-08-07 WO disclosed
US-8226838-B2 Method of forming polymer features by directed self-assembly of block copolymers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-07-24 US disclosed
US-20090179002-A1 METHOD OF FORMING POLYMER FEATURES BY DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-07-16 US disclosed
US-7521094-B1 Method of forming polymer features by directed self-assembly of block copolymers INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-04-21 US disclosed