SCHEMBL4520016

SCHEMBL4520016

CC1C(=O)OC(=O)C1(C)C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 3/20 0.38
CYP3A4 P08684 3/20 0.38
MAPK1 P28482 3/20 0.38
SMN1; SMN2 Q16637 3/20 0.38
HIF1A Q16665 2/20 0.38
LMNA P02545 2/20 0.38
CYP1A2 P05177 2/20 0.38
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
MAPT P10636 2/20 0.38
NFKB1 P19838 1/20 0.38
THPO P40225 1/20 0.38
PPM1B O75688 1/20 0.38
PTPN1 P18031 1/20 0.38
PPP1CC P36873 1/20 0.38
TFPI2 P48307 1/20 0.38
PPP5C P53041 1/20 0.38
PPP2CA P67775 1/20 0.38
PPP1CA P62136 1/20 0.38
KDM4E B2RXH2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13629585 1.00 TP53 (0.38) TP53CYP3A4MAPK1SMN1; SMN2HIF1A
SCHEMBL24452448 0.76 TP53 (0.34) TP53CYP3A4MAPK1SMN1; SMN2HIF1A
SCHEMBL3138269 0.75 TP53 (0.35) TP53CYP3A4MAPK1SMN1; SMN2HIF1A
SCHEMBL17236071 0.75 TP53 (0.35) TP53CYP3A4MAPK1SMN1; SMN2HIF1A
SCHEMBL13992906 0.75 TP53 (0.35) TP53CYP3A4MAPK1SMN1; SMN2HIF1A
SCHEMBL9305398 0.72 TP53 (0.37) TP53CYP3A4MAPK1SMN1; SMN2HIF1A
SCHEMBL2519614 0.72 TP53 (0.37) TP53CYP3A4MAPK1SMN1; SMN2HIF1A
SCHEMBL13515256 0.72 TP53 (0.33) TP53CYP3A4MAPK1SMN1; SMN2HIF1A
SCHEMBL13992911 0.72 TP53 (0.33) TP53CYP3A4MAPK1SMN1; SMN2HIF1A
SCHEMBL11544301 0.69 TP53 (0.35) TP53CYP3A4MAPK1SMN1; SMN2HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5516600-A BARRIER FILM GNB BATTERY TECHNOLOGIES INC. (US) 1996-05-14 US claimed
US-20240230952-A1 LAMINATE AND METHOD FOR MANUFACTURING LAMINATE FUJIFILM CORPORATION (JP) 2024-07-11 US disclosed
CN-111919326-B Electrolyte, electrochemical device, lithium ion secondary battery, assembly, and compound 大金工业株式会社 2024-06-11 CN disclosed
CN-113490674-B Compound, additive for electrolyte, electrochemical device, lithium ion secondary battery, and module 大金工业株式会社 2024-06-07 CN disclosed
CN-118026845-A Fluoroacetate compound 大金工业株式会社 2024-05-14 CN disclosed
CN-111937215-B Electrolyte, electrochemical device, lithium ion secondary battery, and assembly 大金工业株式会社 2024-04-19 CN disclosed
CN-112088456-B Electrolyte, electrochemical device, lithium ion secondary battery and assembly 大金工业株式会社 2024-04-19 CN disclosed
CN-117865841-A Electrolyte, electrochemical device, lithium ion secondary battery and assembly 大金工业株式会社 2024-04-12 CN disclosed
CN-112119528-B Electrolyte, electrochemical device, lithium ion secondary battery and assembly 大金工业株式会社 2024-04-05 CN disclosed
CN-111108642-B Nonaqueous electrolyte, nonaqueous electrolyte secondary battery, and energy device 三菱化学株式会社 2024-04-02 CN disclosed
US-6197102-B1 SMALL AMOUNT OF SEPARATION (SEGREGATION, PRECIPITATION) OF EXCESSIVE METALLIC ELEMENTS' PARTICLES, LITTLE LEAKAGE CURRENT, HYDROGEN HEAT TREATMENT RESISTANCE AS WELL AS VOLTAGE RESISTANCE TOKYO OHKA KOGYO CO., LTD. (JP) 2001-03-06 US disclosed
US-6120912-A THIN FILM MADE BY ANNEALING AN APPLIED COATING SOLUTION OF METAL ALKOXIDES OF BISMUTH, A SPECIFIED METALLIC ELEMENTS A AND B RESPECTIVELY, WHICH CONTAINS COMPOSITE METAL ALKOXIDES FORMED BY ANY TWO OR MORE METAL ALKOXIDES TOKYO OHKA KOGYO CO., LTD. (JP) 2000-09-19 US disclosed
US-5972096-A COMPRISING BISMUTH ALKOXIDE, AT LEAST TWO METALLIC ELEMENTS, ORGANOMETALLIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 1999-10-26 US disclosed
US-5811153-A SOLUTIONS CONTAINING REACTION PRODUCT OF METAL ALKOXIDES, ACETATES OR BETA-DIKETONE COMPLEXES WITH ALCOHOLS, CARBOXYLIC ANHYDRIDES, GLYCOLS, BETA-DIKETONES OR DICARBOXYLIC ACID MONOESTERS TOKYO OHKA KOGYO CO., LTD. (JP) 1998-09-22 US disclosed
EP-0854504-A1 Coating solutions for use in forming bismuth-based ferro-electric thin films, and ferro-electric thin films, ferro-electric capacitors and ferro-electric memories formed with said coating solutions, as well as processes for production thereof TOKYO OHKA KOGYO CO., LTD. (JP) 1998-07-22 EP disclosed
EP-0854503-A1 Coating solutions for use in forming bismuth-based ferro-electric thin films, and ferro-electric thin films, ferro-electric capacitors and ferro-electric memories formed with said coating solutions, as well as processes for production thereof TOKYO OHKA KOGYO CO., LTD. (JP) 1998-07-22 EP disclosed
EP-0608132-B1 Coating varnish composition and antifouling coating composition HITACHI CHEMICAL CO LTD (JP) 1998-05-20 EP disclosed
US-5516600-A BARRIER FILM GNB BATTERY TECHNOLOGIES INC. (US) 1996-05-14 US disclosed
US-5439511-A Composition containing polymer obtained by polymerizing unsaturated acid anhydride and another unsaturated compound, specified additive HITACHI CHEMICAL COMPANY, LTD. (JP) 1995-08-08 US disclosed
EP-0608132-A1 Coating varnish composition and antifouling coating composition HITACHI CHEMICAL CO., LTD. (JP) 1994-07-27 EP disclosed