⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8442315 | 0.98 | — | — | |
| SCHEMBL45437 | 0.97 | — | — | |
| SCHEMBL2048921 | 0.95 | — | — | |
| SCHEMBL29219082 | 0.95 | — | — | |
| SCHEMBL25235511 | 0.92 | — | — | |
| SCHEMBL45269 | 0.92 | — | — | |
| SCHEMBL22042309 | 0.92 | — | — | |
| SCHEMBL45378 | 0.92 | — | — | |
| SCHEMBL12468957 | 0.90 | — | — | |
| SCHEMBL4433290 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107667415-B | Conformal peelable carbon films for advanced patterning with reduced line edge roughness | 应用材料公司 | 2021-10-26 | — | — | CN | disclosed |
| US-10074534-B2 | Ultra-conformal carbon film deposition | APPLIED MATERIALS, INC. (US) | 2018-09-11 | — | — | US | disclosed |
| US-10014174-B2 | Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning | APPLIED MATERIALS, INC. (US) | 2018-07-03 | — | — | US | disclosed |
| CN-107667415-A | Conformal peelable carbon films for advanced patterning with reduced line edge roughness | 应用材料公司 | 2018-02-06 | — | — | CN | disclosed |
| US-20170301537-A1 | ULTRA-CONFORMAL CARBON FILM DEPOSITION | APPLIED MATERIALS, INC. | 2017-10-19 | — | — | US | disclosed |
| CN-104774604-B | A kind of fluorochemical urethane class CO2Gas dissolubility foaming agent and its production and use | 中国石油化工股份有限公司 | 2017-09-29 | — | — | CN | disclosed |
| US-20170278709-A1 | CONFORMAL STRIPPABLE CARBON FILM FOR LINE-EDGE-ROUGHNESS REDUCTION FOR ADVANCED PATTERNING | APPLIED MATERIALS, INC. | 2017-09-28 | — | — | US | disclosed |
| US-9721784-B2 | Ultra-conformal carbon film deposition | APPLIED MATERIALS, INC. (US) | 2017-08-01 | — | — | US | disclosed |
| US-9659771-B2 | Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning | APPLIED MATERIALS, INC. (US) | 2017-05-23 | — | — | US | disclosed |
| US-20160365248-A1 | CONFORMAL STRIPPABLE CARBON FILM FOR LINE-EDGE-ROUGHNESS REDUCTION FOR ADVANCED PATTERNING | APPLIED MATERIALS, INC. | 2016-12-15 | — | — | US | disclosed |
| US-20080153311-A1 | METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSITY AND STEP COVERAGE | APPLIED MATERIALS, INC. | 2008-06-26 | — | — | US | disclosed |
| CN-101122011-A | Methods for low temperature deposition of an amorphous carbon layer | APPLIED MATERIALS INC (US) | 2008-02-13 | — | — | CN | disclosed |
| US-20080003824-A1 | Method For Depositing an Amorphous Carbon Film with Improved Density and Step Coverage | APPLIED MATERIALS, INC. | 2008-01-03 | — | — | US | disclosed |
| WO-2008002844-A2 | METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSITY AND STEP COVERAGE | APPLIED MATERIALS, INC. (US) | 2008-01-03 | — | — | WO | disclosed |
| US-20070286954-A1 | Methods for low temperature deposition of an amorphous carbon layer | APPLIED MATERIALS, INC. | 2007-12-13 | — | — | US | disclosed |
| CN-1930320-A | Liquid precursors for chemical vapor deposition of amorphous carbon films | APPLIED MATERIALS INC (US) | 2007-03-14 | — | — | CN | disclosed |
| US-20050287771-A1 | Liquid precursors for the CVD deposition of amorphous carbon films | APPLIED MATERIALS, INC. | 2005-12-29 | — | — | US | disclosed |
| WO-2005087974-A2 | CVD PROCESSES FOR THE DEPOSITION OF AMORPHOUS CARBON FILMS | APPLIED MATERIALS, INC. (US) | 2005-09-22 | — | — | WO | disclosed |
| US-4910041-A | Generated arced plasma; applying a magnetic field | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-03-20 | — | — | US | disclosed |
| US-4693799-A | LOW TEMPERATURE PULSE DISCHARGING | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-09-15 | — | — | US | disclosed |