SCHEMBL45437

SCHEMBL45437

FCCCCC(F)C(F)C(F)C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2048921 0.97
SCHEMBL45231 0.97
SCHEMBL29219082 0.97
SCHEMBL8442315 0.95
SCHEMBL12468957 0.92
SCHEMBL25235511 0.90
SCHEMBL4433290 0.90
SCHEMBL22042309 0.90
SCHEMBL14879731 0.90
SCHEMBL45269 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110527326-A A kind of aeroge coating and preparation method thereof TANG XUEJIN 2019-12-03 CN claimed
CN-107619467-B Alternate copolymerization method for preparing fluorine-containing polymer based on dibromide compound and diene monomer 苏州大学 2019-06-25 CN claimed
CN-107619467-A Alternate copolymerization method for preparing fluorine-containing polymer based on dibromide compound and diene monomer 苏州大学 2018-01-23 CN claimed
CN-101381693-A Controllable high-efficiency microorganism growth medium/liquid and preparation method thereof XIANGHAI CHEN (CN) 2009-03-11 CN claimed
CN-107667415-B Conformal peelable carbon films for advanced patterning with reduced line edge roughness 应用材料公司 2021-10-26 CN disclosed
CN-110527326-A A kind of aeroge coating and preparation method thereof TANG XUEJIN 2019-12-03 CN disclosed
CN-107619467-B Alternate copolymerization method for preparing fluorine-containing polymer based on dibromide compound and diene monomer 苏州大学 2019-06-25 CN disclosed
CN-107033297-B Siliceous hyper branched polymer and solidification compound containing the polymer 日产化学工业株式会社 2019-04-30 CN disclosed
CN-108699694-A Include the electroless plating substrate agent of highly -branched macromolecule and metal particle 日产化学株式会社 2018-10-23 CN disclosed
US-10074534-B2 Ultra-conformal carbon film deposition APPLIED MATERIALS, INC. (US) 2018-09-11 US disclosed
US-10014174-B2 Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning APPLIED MATERIALS, INC. (US) 2018-07-03 US disclosed
CN-107619467-A Alternate copolymerization method for preparing fluorine-containing polymer based on dibromide compound and diene monomer 苏州大学 2018-01-23 CN disclosed
US-20050287771-A1 Liquid precursors for the CVD deposition of amorphous carbon films APPLIED MATERIALS, INC. 2005-12-29 US disclosed
CN-1220666-C Monomer containing electron drawing group and electron donating group and polymer and proton conductive membrane containing same JSR CORP (JP) 2005-09-28 CN disclosed
WO-2005087974-A2 CVD PROCESSES FOR THE DEPOSITION OF AMORPHOUS CARBON FILMS APPLIED MATERIALS, INC. (US) 2005-09-22 WO disclosed
CN-1154684-C Process for producing surface-modified rubber surface-modified rubberand sealing material thereof �ձ�������ҵ��ʽ���� 2004-06-23 CN disclosed
CN-1379009-A Monomer containing electron drawing group and electron donating group and polymer and proton conductive membrane containing same JSR CORP (JP) 2002-11-13 CN disclosed
CN-1213389-A Process for producing surface-modified rubber surface-modified rubberand sealing material thereof NIHON VALQUA KOGYO KK (JP) 1999-04-07 CN disclosed
US-4910041-A Generated arced plasma; applying a magnetic field JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1990-03-20 US disclosed
US-4693799-A LOW TEMPERATURE PULSE DISCHARGING JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-09-15 US disclosed