⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL454830 | 0.88 | — | — | |
| SCHEMBL450657 | 0.82 | — | — | |
| SCHEMBL12076318 | 0.81 | ALDH1A1 (0.30) | — | |
| SCHEMBL13813929 | 0.76 | — | — | |
| SCHEMBL13813839 | 0.76 | — | — | |
| SCHEMBL452753 | 0.74 | — | — | |
| SCHEMBL3135417 | 0.74 | ALDH1A1 (0.31) | — | |
| SCHEMBL7764323 | 0.74 | ALDH1A1 (0.31) | — | |
| SCHEMBL8176892 | 0.71 | — | — | |
| SCHEMBL2863574 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-18 | — | — | US | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| US-20200089116-A1 | Fluorine-Containing Monomer, Fluorine-Containing Polymer, Pattern Forming Composition Using Same, and Pattern Forming Method of Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2020-03-19 | — | — | US | disclosed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8663903-B2 | Top coating composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8592540-B2 | Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-11-26 | — | — | US | disclosed |
| US-20130216960-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-22 | — | — | US | disclosed |
| US-20130209938-A1 | Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same | CENTRAL GLASS COMPANY, LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| US-8466310-B2 | Process for producing α-substituted norbornanyl acrylates | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-06-18 | — | — | US | disclosed |
| US-20120064459-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120040294-A1 | Top Coating Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20110318542-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110137073-A1 | Process for Producing Alpha-Substituted Norbornanyl Acrylates | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-06-09 | — | — | US | disclosed |
| EP-1790645-A1 | LACTONE COMPOUND, LACTONE-CONTAINING MONOMER, POLYMER OF THOSE, RESIST COMPOSITION USING SAME, METHOD FOR FORMING PATTERN USING SAME | Central Glass Company, Limited (JP) | 2007-05-30 | — | — | EP | disclosed |
| US-20060270864-A1 | Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-11-30 | — | — | US | disclosed |
| US-20060194143-A1 | Fluorine-containing polymerizable monomers, fluorine-containing polymer compounds, resist compositions using the same, and patterning process | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-08-31 | — | — | US | disclosed |