Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.52 |
| ▸ | TSHR | P16473 | 6/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | TP53 | P04637 | 2/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CASP1 | P29466 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.32 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14521446 | 0.95 | TSHR (0.45) | MEN1KMT2ATSHRMAPK1ALDH1A1 | |
| SCHEMBL2192211 | 0.90 | TSHR (0.45) | MEN1KMT2ATSHRMAPK1ALDH1A1 | |
| SCHEMBL7122301 | 0.90 | MEN1 (0.43) | MEN1KMT2ATSHRMAPK1ALDH1A1 | |
| SCHEMBL1932585 | 0.89 | MEN1 (0.40) | MEN1KMT2ATSHRMAPK1ALDH1A1 | |
| SCHEMBL14134498 | 0.89 | MEN1 (0.40) | MEN1KMT2ATSHRMAPK1ALDH1A1 | |
| SCHEMBL20913713 | 0.88 | MEN1 (0.50) | MEN1KMT2ATSHRMAPK1ALDH1A1 | |
| SCHEMBL28250371 | 0.88 | TSHR (0.43) | MEN1KMT2ATSHRMAPK1ALDH1A1 | |
| SCHEMBL27978106 | 0.88 | TSHR (0.43) | MEN1KMT2ATSHRMAPK1ALDH1A1 | |
| SCHEMBL1401404 | 0.87 | MEN1 (0.45) | MEN1KMT2ATSHRMAPK1ALDH1A1 | |
| SCHEMBL3311929 | 0.87 | ALDH1A1 (0.50) | MEN1KMT2ATSHRMAPK1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118339509-A | Liquid crystal aligning agent and liquid crystal display element | 日产化学株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-118043732-A | Weak anchoring liquid crystal aligning agent, liquid crystal display element and polymer | 日产化学株式会社 | 2024-05-14 | — | — | CN | disclosed |
| CN-117677641-A | Fluoroaryl sulfonic acid polymer compound and use thereof | 日产化学株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-117148630-A | Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element | 日产化学株式会社 | 2023-12-01 | — | — | CN | disclosed |
| CN-111868620-B | Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element | 日产化学株式会社 | 2023-11-03 | — | — | CN | disclosed |
| CN-115584267-B | Liquid crystal aligning agent and application thereof | 波米科技有限公司 | 2023-08-04 | — | — | CN | disclosed |
| CN-116323702-A | Method for producing single-layer phase difference material | 日产化学株式会社 | 2023-06-23 | — | — | CN | disclosed |
| WO-2019182072-A1 | POLYUREA COPOLYMER, LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT USING SAME | 日産化学株式会社 | 2019-09-26 | — | — | WO | disclosed |
| WO-2019182071-A1 | LIQUID CRYSTAL ALIGNMENT AGENT, POLYMER FOR OBTAINING SAME, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT USING SAME | 日産化学株式会社 | 2019-09-26 | — | — | WO | disclosed |
| WO-2019182070-A1 | LIQUID CRYSTAL ALIGNING AGENT, POLYMER FOR OBTAINING SAME, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT USING SAME | 日産化学株式会社 | 2019-09-26 | — | — | WO | disclosed |
| WO-2019163904-A1 | METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2019-08-29 | — | — | WO | disclosed |
| US-20090081590-A1 | NEGATIVE RESIST COMPOSITION AND PROCESS FOR FORMING RESIST PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |