SCHEMBL4530110

SCHEMBL4530110

CCCC(CO)(CCC)CCC

nearest known ligand 0.37

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.37
ALDH1A1 P00352 4/20 0.37
FDPS P14324 2/20 0.33
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL39090 0.93 TSHR (0.37) TSHRALDH1A1FDPSSMN1; SMN2
SCHEMBL1053504 0.93 TSHR (0.37) TSHRALDH1A1FDPSSMN1; SMN2
SCHEMBL29316638 0.91 ALDH1A1 (0.33) TSHRALDH1A1SMN1; SMN2
SCHEMBL11805474 0.91 ALDH1A1 (0.33) TSHRALDH1A1SMN1; SMN2
SCHEMBL2347158 0.88 ALDH1A1 (0.38) TSHRALDH1A1FDPSSMN1; SMN2
SCHEMBL2345789 0.88 ALDH1A1 (0.38) TSHRALDH1A1FDPSSMN1; SMN2
SCHEMBL245331 0.87 ALDH1A1 (0.33) TSHRALDH1A1FDPS
SCHEMBL6742595 0.87 ALDH1A1 (0.33) TSHRALDH1A1FDPS
SCHEMBL26793109 0.87 ALDH1A1 (0.33) TSHRALDH1A1FDPS
SCHEMBL11781892 0.86 SMN1; SMN2 (0.48) TSHRALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0324980-B1 Norbornene formulations with longer pot lives and lower molding temperatures GOODRICH CO B F (US) 1995-03-29 EP claimed
EP-0324979-B1 Norbornene formulations with longer pot lives GOODRICH CO B F (US) 1994-03-23 EP claimed
EP-0324980-A2 Norbornene formulations with longer pot lives and lower molding temperatures THE B.F. GOODRICH COMPANY (US) 1989-07-26 EP claimed
EP-0324979-A2 Norbornene formulations with longer pot lives THE B.F. GOODRICH COMPANY (US) 1989-07-26 EP claimed
CN-115135696-B Low nucleation temperature polythioether prepolymers and uses thereof PRC-迪索托国际公司 2023-12-29 CN disclosed
CN-101263429-B pattern forming method using film-forming composition TOKYO OHKA KOGYO CO.,LTD. (JP) 2011-12-28 CN disclosed
US-20090155546-A1 FILM-FORMING COMPOSITION, METHOD FOR PATTERN FORMATION, AND THREE-DIMENSIONAL MOLD TOKYO OHKA KOGYO CO., LTD. (JP) 2009-06-18 US disclosed
CN-101263429-A Film-forming composition, pattern-forming method using the same, and three-dimensional mold TOKYO OHKA KOGYO CO LTD (JP) 2008-09-10 CN disclosed
EP-0460652-B1 Method for producing a molded article obtained from norbornene formulations with long pot lives GOODRICH CO B F (US) 2001-09-26 EP disclosed
EP-0324980-B1 Norbornene formulations with longer pot lives and lower molding temperatures GOODRICH CO B F (US) 1995-03-29 EP disclosed
EP-0324979-B1 Norbornene formulations with longer pot lives GOODRICH CO B F (US) 1994-03-23 EP disclosed
EP-0460652-A2 Molded articles obtained from norbornene formulations with long pot lives THE B.F. GOODRICH COMPANY (US) 1991-12-11 EP disclosed
EP-0324980-A2 Norbornene formulations with longer pot lives and lower molding temperatures THE B.F. GOODRICH COMPANY (US) 1989-07-26 EP disclosed
EP-0324979-A2 Norbornene formulations with longer pot lives THE B.F. GOODRICH COMPANY (US) 1989-07-26 EP disclosed