Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL463451 | 0.88 | — | — | |
| Hydrochloric Acid SCHEMBL450325 | 0.86 | — | — | |
| Hydrochloric Acid SCHEMBL452057 | 0.86 | — | — | |
| Hydrochloric Acid SCHEMBL455227 | 0.85 | — | — | |
| Hydrochloric Acid SCHEMBL453974 | 0.84 | — | — | |
| Hydrochloric Acid SCHEMBL453831 | 0.84 | — | — | |
| Hydrochloric Acid SCHEMBL455538 | 0.83 | — | — | |
| Hydrochloric Acid SCHEMBL455379 | 0.83 | — | — | |
| Hydrochloric Acid SCHEMBL453403 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL452177 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 192 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114763394-A | Nonionic hyperbranched hydrophobically associating polyacrylamide thickening agent and preparation method thereof | 中国石油天然气股份有限公司 | 2022-07-19 | — | — | CN | claimed |
| CN-114751829-A | Polymerizable nonionic surfactant containing adamantane structure and preparation method thereof | 中国石油天然气股份有限公司 | 2022-07-15 | — | — | CN | claimed |
| EP-1007518-A4 | SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE | SEPRACOR INC (US) | 2002-11-06 | — | — | EP | claimed |
| US-6177572-B1 | 2-AMIDOPHENOL OR 2-AMIDOTHIOPHENOL IS COUPLED TO A SOLID PHASE SUPPORT THROUGH A LINKER GROUP, SUCH THAT A BENZOXAZOLE OR A BENZOTHIAZOLE IS FORMED | SEPRACOR, INC. | 2001-01-23 | — | — | US | claimed |
| EP-1007518-A1 | SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE | SEPRACOR, INC. (US) | 2000-06-14 | — | — | EP | claimed |
| WO-1999009017-A1 | SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE | SEPRACOR INC. (US) | 1999-02-25 | — | — | WO | claimed |
| CN-113939767-B | Positive photosensitive resin composition and organic EL element partition wall | 日保丽公司 | 2024-06-25 | — | — | CN | disclosed |
| CN-118020025-A | Photosensitive resin composition, cured product, organic EL display device, semiconductor device, and method for producing cured product | 东丽株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117882008-A | Positive photosensitive resin composition | 日保丽公司 | 2024-04-12 | — | — | CN | disclosed |
| CN-117480451-A | Positive photosensitive resin composition and organic EL element partition wall | 日保丽公司 | 2024-01-30 | — | — | CN | disclosed |
| WO-2024017921-A1 | DEVELOPER TOLERANCE RESIST UNDERLAYER COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN | MERCK PATENT GMBH (DE) | 2024-01-25 | — | — | WO | disclosed |
| US-20230408922-A1 | APPLICATION LIQUID FOR OPTICAL MEMBER, POLYMER, PHOTOSENSITIVE APPLICATION LIQUID, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING PATTERNED CURED FILM, AND METHOD FOR PRODUCING POLYMER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-12-21 | — | — | US | disclosed |
| CN-116940897-A | Photosensitive resin composition and organic EL element partition wall | 株式会社力森诺科 | 2023-10-24 | — | — | CN | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| US-6177572-B1 | 2-AMIDOPHENOL OR 2-AMIDOTHIOPHENOL IS COUPLED TO A SOLID PHASE SUPPORT THROUGH A LINKER GROUP, SUCH THAT A BENZOXAZOLE OR A BENZOTHIAZOLE IS FORMED | SEPRACOR, INC. | 2001-01-23 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| US-6087063-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-11 | — | — | US | disclosed |
| EP-1007518-A1 | SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE | SEPRACOR, INC. (US) | 2000-06-14 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| WO-1999009017-A1 | SOLID AND LIQUID-PHASE SYNTHESIS OF BENZOXAZOLES AND BENZOTHIAZOLES AND THEIR USE | SEPRACOR INC. (US) | 1999-02-25 | — | — | WO | disclosed |