Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL1141300 | 0.92 | — | — | |
| Hydrochloric Acid SCHEMBL455001 | 0.88 | MEN1 (0.30) | — | |
| Hydrochloric Acid SCHEMBL452997 | 0.87 | — | — | |
| Hydrochloric Acid SCHEMBL452746 | 0.86 | — | — | |
| Hydrochloric Acid SCHEMBL2276418 | 0.86 | — | — | |
| Hydrochloric Acid SCHEMBL453171 | 0.85 | — | — | |
| Hydrochloric Acid SCHEMBL453466 | 0.85 | — | — | |
| Hydrochloric Acid SCHEMBL454412 | 0.83 | — | — | |
| Hydrochloric Acid SCHEMBL450100 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL453614 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9604891-B2 | Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-03-28 | — | — | US | disclosed |
| EP-1473323-B1 | Polyethylene composition and process for producing same | TOSOH CORP (JP) | 2016-04-27 | — | — | EP | disclosed |
| US-20150361026-A1 | Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-17 | — | — | US | disclosed |
| US-8663903-B2 | Top coating composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-20130216960-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-22 | — | — | US | disclosed |
| US-20120064459-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120040294-A1 | Top Coating Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-16 | — | — | US | disclosed |
| US-8115036-B2 | Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-14 | — | — | US | disclosed |
| US-7781602-B2 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20100204422-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | disclosed |
| US-7736835-B2 | Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20080194764-A1 | Fluorinated Cyclic Compound, Polymerizable Fluoromonomer, Fluoropolymer, Resist Material Comprising the Same, and Method of Forming Pattern with the Same | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-14 | — | — | US | disclosed |
| US-20080003517-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20060135744-A1 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | CENTRAL GLASS COMPANY LIMITED (JP) | 2006-06-22 | — | — | US | disclosed |
| US-20040225159-A1 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LTD. (JP) | 2004-11-11 | — | — | US | disclosed |