Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 8/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.37 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.37 |
| ▸ | SLC22A12 | Q96S37 | 10/20 | 0.37 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.35 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.35 |
| ▸ | SLC22A11 | Q9NSA0 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2898442 | 0.92 | MEN1 (0.42) | HSD11B1MEN1KMT2ASLC22A12CYP3A4 | |
| SCHEMBL2901085 | 0.87 | MEN1 (0.41) | HSD11B1MEN1KMT2ASLC22A12CYP3A4 | |
| SCHEMBL5405455 | 0.87 | HSD11B1 (0.40) | HSD11B1MEN1KMT2ASLC22A12CYP3A4 | |
| SCHEMBL455244 | 0.87 | MEN1 (0.45) | HSD11B1MEN1KMT2ASLC22A12CYP3A4 | |
| SCHEMBL4419127 | 0.84 | KDM1A (0.41) | HSD11B1MEN1KMT2ASLC22A12 | |
| SCHEMBL5416323 | 0.84 | MEN1 (0.38) | HSD11B1MEN1KMT2ASLC22A12 | |
| SCHEMBL5422190 | 0.84 | MEN1 (0.38) | HSD11B1MEN1KMT2AFFAR4SLC22A12 | |
| SCHEMBL2966142 | 0.83 | HSD11B1 (0.41) | HSD11B1MEN1KMT2AHSD17B3 | |
| SCHEMBL4654827 | 0.83 | KMT2A (0.45) | MEN1KMT2AFFAR4SLC22A12 | |
| SCHEMBL5414995 | 0.82 | HSD11B1 (0.38) | HSD11B1MEN1KMT2ASLC22A12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| US-20200272050-A1 | Enhanced EUV Photoresist Materials, Formulations and Processes | IRRESISTIBLE MATERIALS, LTD (GB) | 2020-08-27 | — | — | US | disclosed |
| EP-2841255-B1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | CANON KK (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-10472445-B2 | Photocurable composition and method for manufacturing film | CANON KABUSHIKI KAISHA (JP) | 2019-11-12 | — | — | US | disclosed |
| EP-2758987-B1 | METHOD OF FORMING A FILM | CANON KK (JP) | 2019-03-20 | — | — | EP | disclosed |
| US-10208183-B2 | Curable composition, film, and method of producing film | CANON KABUSHIKI KAISHA (JP) | 2019-02-19 | — | — | US | disclosed |
| US-10095112-B2 | Multiple trigger photoresist compositions and methods | IRRESISTIBLE MATERIALS LTD (GB) | 2018-10-09 | — | — | US | disclosed |
| US-20180246408-A1 | MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHODS | IRRESISTIBLE MATERIALS, LTD (GB) | 2018-08-30 | — | — | US | disclosed |
| US-9982102-B2 | Photocurable composition and method of manufacturing film using the composition | CANON KABUSHIKI KAISHA (JP) | 2018-05-29 | — | — | US | disclosed |
| US-6203965-B1 | USEFUL AS DEEP ULTRAVIOLET RADIATION PHOTORESISTS | SHIPLEY COMPANY, L.L.C. | 2001-03-20 | — | — | US | disclosed |
| US-6200728-B1 | Photoresist compositions comprising blends of photoacid generators | SHIPLEY COMPANY, L.L.C. | 2001-03-13 | — | — | US | disclosed |
| US-6143460-A | PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION | JSR CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| US-6136500-A | CONTAINS A PHOTOACID GENERATOR COMPRISING A COMBINATION OF A COMPOUND THAT GENERATES A CARBOXYLIC ACID UPON EXPOSURE TO RADIATION AND ANOTHER COMPOUND THAT GENERATES ANOTHER ACID UPON EXPOSURE TO RADIATION | JSR CORPORATION (JP) | 2000-10-24 | — | — | US | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-1030221-A1 | Photoresist compositions comprising blends of photoacid generators | Shipley Company LLC (US) | 2000-08-23 | — | — | EP | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |
| US-6037107-A | EXPOSING TO ACTIVATION RADIATION A POSITIVE WORKING PHOTORESIST COMPRISING AN ALKALI SOLUBLE RESIN SUBSTITUTED WITH AN ACID LABILE BLOCKING GROUP TO GENERATE HALOGENATED SULFONIC ACID BY PHOTOLYSIS | SHIPLEY COMPANY, L.L.C. (US) | 2000-03-14 | — | — | US | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10095112-B2 | Multiple trigger photoresist compositions and methods | ERCC4, ERCC2, APEX1 | HSD11B1 3846/4885MEN1 3826/4885KMT2A 2012/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.