⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6671203 | 0.81 | — | — | |
| SCHEMBL14991316 | 0.75 | — | — | |
| SCHEMBL2623204 | 0.74 | TSHR (0.35) | — | |
| SCHEMBL15496346 | 0.73 | — | — | |
| SCHEMBL27416453 | 0.71 | — | — | |
| SCHEMBL10071485 | 0.70 | ALDH1A1 (0.35) | — | |
| SCHEMBL2623205 | 0.70 | ALDH1A1 (0.38) | — | |
| SCHEMBL5028721 | 0.69 | — | — | |
| SCHEMBL10071487 | 0.69 | ALDH1A1 (0.41) | — | |
| SCHEMBL3681120 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-18 | — | — | US | disclosed |
| CN-117897416-A | Copolymer and resin composition | 大金工业株式会社 | 2024-04-16 | — | — | CN | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-116848162-A | Fluorine-containing polymer | 中央硝子株式会社 | 2023-10-03 | — | — | CN | disclosed |
| US-11737345-B2 | Organic electronic material, ink composition containing same, and organic thin film, organic electronic element, organic electroluminescent element, lighting device, and display device formed therewith | RESONAC CORPORATION (JP) | 2023-08-22 | — | — | US | disclosed |
| CN-116615410-A | Method for producing fluorine-containing polymer and composition | 中央硝子株式会社 | 2023-08-18 | — | — | CN | disclosed |
| US-11281102-B2 | Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-03-22 | — | — | US | disclosed |
| EP-2439804-B1 | ORGANIC ELECTRONIC MATERIAL, INK COMPOSITION CONTAINING SAME, AND ORGANIC THIN FILM, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, LIGHTING DEVICE, AND DISPLAY DEVICE FORMED THEREWITH | SHOWA DENKO MATERIALS CO LTD (JP) | 2021-07-21 | — | — | EP | disclosed |
| CN-110730790-B | Fluorine-containing monomer, fluorine-containing polymer, composition for forming pattern using same, and method for forming pattern using same | 中央硝子株式会社 | 2021-06-15 | — | — | CN | disclosed |
| US-10840451-B2 | Organic electronic material, ink composition containing same, and organic thin film, organic electronic element, organic eletroluminescent element, lighting device, and display device formed therewith | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2020-11-17 | — | — | US | disclosed |
| US-20060270864-A1 | Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-11-30 | — | — | US | disclosed |
| US-20060264591-A1 | Fluorine-containing compounds and their polymers useful for anti-relfection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-11-23 | — | — | US | disclosed |
| US-7125943-B2 | Fluorine containing compounds with unsaturated ether or ester groups | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-10-24 | — | — | US | disclosed |
| US-7122292-B2 | Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-10-17 | — | — | US | disclosed |
| US-20060194143-A1 | Fluorine-containing polymerizable monomers, fluorine-containing polymer compounds, resist compositions using the same, and patterning process | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-08-31 | — | — | US | disclosed |
| US-20060135744-A1 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | CENTRAL GLASS COMPANY LIMITED (JP) | 2006-06-22 | — | — | US | disclosed |
| US-20060057489-A1 | Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-03-16 | — | — | US | disclosed |
| US-6858760-B2 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-02-22 | — | — | US | disclosed |
| US-20040225159-A1 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LTD. (JP) | 2004-11-11 | — | — | US | disclosed |
| US-20040106755-A1 | Fluorine containing compounds with unsaturated ether or ester groups | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-06-03 | — | — | US | disclosed |