⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10547847 | 0.97 | ALDH1A1 (0.36) | — | |
| Acetic Acid SCHEMBL10936880 | 0.83 | FFAR3 (0.39) | — | |
| SCHEMBL452902 | 0.79 | KDM4C (0.42) | — | |
| SCHEMBL51292 | 0.78 | — | — | |
| SCHEMBL10799052 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL28103727 | 0.76 | KCNN4 (0.31) | — | |
| Water SCHEMBL11323077 | 0.76 | — | — | |
| SCHEMBL391785 | 0.74 | FFAR3 (0.35) | — | |
| SCHEMBL28936457 | 0.74 | ALDH1A1 (0.35) | — | |
| SCHEMBL22487745 | 0.74 | FFAR3 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 251 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250313722-A1 | CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | SOULBRAIN CO., LTD. (KR) | 2025-10-09 | — | — | US | claimed |
| US-12365945-B2 | Urinary microbiomic profiling | Convergent Genomics, Inc. (US) | 2025-07-22 | — | — | US | claimed |
| CN-109957323-A | A kind of ionic polyurethanes class anti-fog thin film and preparation method thereof | 江南大学 | 2019-07-02 | — | — | CN | claimed |
| EP-3069801-B1 | MATERIAL SET FOR FORMING THREE-DIMENSIONAL OBJECT AND THREE-DIMENSIONAL OBJECT PRODUCING METHOD | RICOH CO LTD (JP) | 2019-05-08 | — | — | EP | claimed |
| CN-109142613-A | Method for determining content of N, N-dihydroxyethyl glycine in alcohol amine solution | 中国石油天然气股份有限公司 | 2019-01-04 | — | — | CN | claimed |
| EP-1692145-B1 | METHODS FOR PRODUCING COPPER ETHANOLAMINE SOLUTIONS | ARCH CHEM INC (US) | 2013-09-04 | — | — | EP | claimed |
| EP-2199379-A1 | Wet clean compositions for CoWP and porous dielectrics | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-23 | — | — | EP | claimed |
| US-20100152086-A1 | Wet Clean Compositions for CoWP and Porous Dielectrics | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-17 | — | — | US | claimed |
| CN-101439028-A | Hypromellose composition and application thereof in preparing plant base medicinal capsule | HUZHOU HOPETOP PHARMACEUTICAL (CN) | 2009-05-27 | — | — | CN | claimed |
| EP-1091254-B1 | Resist stripping composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-01-21 | — | — | EP | claimed |
| US-20050087718-A1 | Comprises aqueous solution containing calcium or calcium hydroxidet; prevents hair and animal fiber damage associated with permanent wave treatments, bleaching treatments | YUGEN KAISHA H&K ASSOCIATE (JP) | 2005-04-28 | — | — | US | claimed |
| EP-1117736-B1 | MODIFIED STARCH FILM COMPOSITIONS | WARNER LAMBERT CO (US) | 2004-07-14 | — | — | EP | claimed |
| EP-0742495-A1 | Chelating reagent containing photoresist stripper composition | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-11-13 | — | — | EP | claimed |
| JP-60149491-A | — | — | None | — | — | JP | disclosed |
| US-20250313722-A1 | CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | SOULBRAIN CO., LTD. (KR) | 2025-10-09 | — | — | US | disclosed |
| EP-4615892-A1 | A COMPOSITION, A PREPARATION METHOD AND USE THEREOF | Covestro Deutschland AG (DE) | 2025-09-17 | — | — | EP | disclosed |
| JP-S60149491-A | SUPPORTING BODY FOR LITHOGRAPHIC PLATE | FUJI PHOTO FILM CO LTD | 1985-08-06 | — | — | JP | disclosed |
| EP-0126991-A1 | A method for preventing deposition of polymer scale and a coating agent therefor | Shin-Etsu Chemical Co., Ltd. (JP) | 1984-12-05 | — | — | EP | disclosed |
| US-4362791-A | CONTAINING A COMPLEXING OR CHELATING AGENT | AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY (JP) | 1982-12-07 | — | — | US | disclosed |
| US-4115634-A | URETHANE BY POLYMERIZING POLYISOCYANATE AND COMPOUND WITH ACTIVE HYDROGEN, ORGANOMETALLIC CATALYST | AIR PRODUCTS & CHEMICALS, INC. (US) | 1978-09-19 | — | — | US | disclosed |