Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.34 |
| ▸ | CA9 | Q16790 | 2/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL131940 | 1.00 | CA2 (0.34) | CA2CA9CA12CA1CA7 | |
| SCHEMBL2541678 | 1.00 | — | — | |
| Sulfuric Acid SCHEMBL29020621 | 0.97 | CA2 (0.33) | CA2CA9CA12CA1CA7 | |
| SCHEMBL29655 | 0.97 | — | — | |
| SCHEMBL28900865 | 0.97 | CA2 (0.36) | CA2CA9CA12CA1CA7 | |
| SCHEMBL15349414 | 0.97 | CA2 (0.36) | CA2CA9CA12CA1CA7 | |
| SCHEMBL2537776 | 0.95 | — | — | |
| Hydrochloric Acid SCHEMBL15918860 | 0.95 | — | — | |
| Rubidium SCHEMBL2548472 | 0.95 | — | — | |
| SCHEMBL2548470 | 0.95 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020195819-A1 | METHOD FOR MANUFACTURING OPTICAL FILM AND OPTICAL FILM | コニカミノルタ株式会社 | 2020-10-01 | — | — | WO | disclosed |
| US-9581728-B2 | Retardation film, polarizing plate and liquid crystal display | Konica Minolta, Inc. (JP) | 2017-02-28 | — | — | US | disclosed |
| US-20150323703-A1 | RETARDATION FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY | Konica Minolta, Inc. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20090233221-A1 | NEGATIVE-WORKING PHOTOSENSITIVE MATERIAL AND NEGATIVE-WORKING PLANOGRAPHIC PRINTING PLATE PRECURSOR | FUJIFILM CORPORATION (JP) | 2009-09-17 | — | — | US | disclosed |
| EP-1520695-B1 | Photosensitive composition and image recording material using the same | FUJIFILM CORP (JP) | 2008-12-10 | — | — | EP | disclosed |
| US-7244547-B2 | Photosensitive composition and image recording material using the same | FUJIFILM CORPORATION (JP) | 2007-07-17 | — | — | US | disclosed |
| EP-1120245-B1 | Infrared-sensitive image forming material | FUJI PHOTO FILM CO LTD (JP) | 2005-11-09 | — | — | EP | disclosed |
| US-20050100821-A1 | Photosensitive composition and image recording material using the same | FUJI PHOTO FILM CO., LTD. | 2005-05-12 | — | — | US | disclosed |
| EP-1520695-A2 | Photosensitive composition and image recording material using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-04-06 | — | — | EP | disclosed |
| US-6727031-B2 | SUPPORT AND A RECORDING LAYER WHOSE SOLUBILITY IS ALTERED BY IRRADIATION WITH INFRARED LASER; USED FOR PRINTING PLATES, COLOR FILTERS, PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20010026900-A1 | Support and a recording layer whose solubility is altered by irradiation with infrared laser; used for printing plates, color filters, photoresists | FUJIFILM CORPORATION (JP) | 2001-10-04 | — | — | US | disclosed |
| EP-1120245-A2 | Infrared-sensitive image forming material | FUJI PHOTO FILM CO., LTD. (JP) | 2001-08-01 | — | — | EP | disclosed |
| US-5723253-A | PHOTOSENSITIVITY FOR LITHOGRAPHIC PRINTING PLATES | KONICA CORPORATION (JP) | 1998-03-03 | — | — | US | disclosed |
| EP-0466071-B1 | Method of developing presensitized offset printing plates and developing solution used in that method | KONISHIROKU PHOTO IND (JP) | 1997-12-10 | — | — | EP | disclosed |
| EP-0639797-B1 | Light-sensitive lithographic printing plate and method of processing the same | KONISHIROKU PHOTO IND (JP) | 1997-07-30 | — | — | EP | disclosed |
| US-5635328-A | Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound | KONICA CORPORATION (JP) | 1997-06-03 | — | — | US | disclosed |
| EP-0716344-A1 | Light-sensitive composition and light-sensitive lithographic printing plate using the same | KONICA CORPORATION (JP) | 1996-06-12 | — | — | EP | disclosed |
| EP-0639797-A1 | Light-sensitive lithographic printing plate and method of processing the same | KONICA CORPORATION (JP) | 1995-02-22 | — | — | EP | disclosed |
| US-5234796-A | Developer contains silica, a surfactant, an aromatic carboxylic acid, and a hydroxyamine compound | KONICA CORPORATION (JP) | 1993-08-10 | — | — | US | disclosed |
| EP-0466071-A2 | Method of developing presensitized offset printing plates and developing solution used in that method | KONICA CORPORATION (JP) | 1992-01-15 | — | — | EP | disclosed |