Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.62 |
| ▸ | CA12 | O43570 | 2/20 | 0.62 |
| ▸ | CA1 | P00915 | 2/20 | 0.62 |
| ▸ | CA2 | P00918 | 2/20 | 0.62 |
| ▸ | CA7 | P43166 | 2/20 | 0.62 |
| ▸ | CA9 | Q16790 | 2/20 | 0.62 |
| ▸ | NR5A1 | Q13285 | 1/20 | 0.61 |
| ▸ | TP53 | P04637 | 1/20 | 0.58 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.57 |
| ▸ | PLA2G4B | P0C869 | 2/20 | 0.57 |
| ▸ | NPC1 | O15118 | 1/20 | 0.55 |
| ▸ | RAB9A | P51151 | 1/20 | 0.55 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.55 |
| ▸ | RECQL | P46063 | 1/20 | 0.55 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.55 |
| ▸ | RARB | P10826 | 3/20 | 0.54 |
| ▸ | LTA4H | P09960 | 2/20 | 0.53 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4528116 | 1.00 | TSHR (0.62) | TSHRCA12CA1CA2CA7 | |
| SCHEMBL4539506 | 1.00 | TSHR (0.62) | TSHRCA12CA1CA2CA7 | |
| SCHEMBL4532493 | 1.00 | TSHR (0.62) | TSHRCA12CA1CA2CA7 | |
| SCHEMBL4530059 | 1.00 | TSHR (0.62) | TSHRCA12CA1CA2CA7 | |
| SCHEMBL4524560 | 1.00 | TSHR (0.62) | TSHRCA12CA1CA2CA7 | |
| SCHEMBL4529708 | 1.00 | TSHR (0.62) | TSHRCA12CA1CA2CA7 | |
| SCHEMBL4533770 | 1.00 | TSHR (0.62) | TSHRCA12CA1CA2CA7 | |
| SCHEMBL4533781 | 1.00 | TSHR (0.62) | TSHRCA12CA1CA2CA7 | |
| SCHEMBL4527703 | 1.00 | TSHR (0.62) | TSHRCA12CA1CA2CA7 | |
| SCHEMBL4531551 | 1.00 | TSHR (0.62) | TSHRCA12CA1CA2CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117904081-A | Protease variants and polynucleotides encoding same | 诺维信公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-117904083-A | Protease variants and polynucleotides encoding same | 诺维信公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-117904084-A | Protease variants and polynucleotides encoding same | 诺维信公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-117165561-A | Protease variants and polynucleotides encoding same | 诺维信公司 | 2023-12-05 | — | — | CN | disclosed |
| CN-114480035-A | Detergent composition and use thereof | 诺维信公司 | 2022-05-13 | — | — | CN | disclosed |
| CN-109312270-B | Detergent composition and use thereof | 诺维信公司 | 2022-01-28 | — | — | CN | disclosed |
| CN-108495921-B | Detergent composition and use thereof | 诺维信公司 | 2020-12-15 | — | — | CN | disclosed |
| CN-108291178-B | Detergent compositions comprising amylase and protease variants | 诺维信公司 | 2020-08-04 | — | — | CN | disclosed |
| US-8187373-B2 | Printing inks for offset and/or high printing containing NIR absorbers and NIR absorbers soluble in offset and/or high printing inks | BASF SE (DE) | 2012-05-29 | — | — | US | disclosed |
| US-8187373-B2 | Printing inks for offset and/or high printing containing NIR absorbers and NIR absorbers soluble in offset and/or high printing inks | BASF SE (DE) | 2012-05-29 | — | — | US | disclosed |
| US-7901494-B2 | Printing inks for offset and/or high printing containing NIR absorbers and NIR absorbers soluble in offset and/or high printing inks | BASF SE (DE) | 2011-03-08 | — | — | US | disclosed |
| US-20100126386-A1 | RADIATION-CURABLE COATING SUBSTANCES | BASF AKTIENGESELLSCHAFT (DE) | 2010-05-27 | — | — | US | disclosed |
| US-20100126386-A1 | RADIATION-CURABLE COATING SUBSTANCES | BASF AKTIENGESELLSCHAFT (DE) | 2010-05-27 | — | — | US | disclosed |
| US-7534554-B2 | Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition | NEC ELECTRONICS CORPORATION (JP) | 2009-05-19 | — | — | US | disclosed |
| US-20080233518-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE WITH SUCH CHEMICALLY AMPLIFIED RESIST COMPOSITION | NEC ELECTRONICS CORPORATION (JP) | 2008-09-25 | — | — | US | disclosed |
| US-7396633-B2 | Damascene process; forming connectors; exposure; development; using acid generator, quencher and buffer | NEC ELECTRONICS CORPORATION (JP) | 2008-07-08 | — | — | US | disclosed |
| US-7323437-B2 | Process for producing a bleaching activator composition | KAO CORPORATION (JP) | 2008-01-29 | — | — | US | disclosed |
| US-20070277700-A1 | Printing Inks For Offset And/Or High Printing Containing Nir Absorbers And Nir Absorbers Soluble In Offset And/Or High Printing Inks | BASF AKTIENGESELLSCHAFT (DE) | 2007-12-06 | — | — | US | disclosed |
| US-20070277700-A1 | Printing Inks For Offset And/Or High Printing Containing Nir Absorbers And Nir Absorbers Soluble In Offset And/Or High Printing Inks | BASF AKTIENGESELLSCHAFT (DE) | 2007-12-06 | — | — | US | disclosed |
| US-20040259029-A1 | Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition | NEC ELECTRONICS CORPORATION (JP) | 2004-12-23 | — | — | US | disclosed |