SCHEMBL4539210

SCHEMBL4539210

C=C(C)C(=O)O[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15963 0.76 ALDH1A1 (0.61)
SCHEMBL2215339 0.76 ALDH1A1 (0.61)
SCHEMBL31589203 0.73 ALDH1A1 (0.58)
SCHEMBL31415277 0.73 ALDH1A1 (0.58)
SCHEMBL31462280 0.73 ALDH1A1 (0.58)
SCHEMBL573944 0.73
SCHEMBL8953021 0.73 ALDH1A1 (0.58)
SCHEMBL1849 0.73
Hydrochloric Acid SCHEMBL17099626 0.73 ALDH1A1 (0.58)
SCHEMBL10636466 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103764740-A Silane crosslinkable polymer composition BOREALIS AG 2014-04-30 CN claimed
EP-0672739-B1 THERMOREVERSIBLE THICKENER SANYO CHEMICAL IND LTD (JP) 2001-01-03 EP claimed
JP-60263949-A None JP disclosed
JP-2251508-A None JP disclosed
JP-63175019-A None JP disclosed
CN-110483780-A A kind of process for separation and purification of the polyhedral oligomeric silsesquioxane containing methacryloxy HARBIN INST TECHNOLOGY 2019-11-22 CN disclosed
CN-108192101-A Fluorine-containing oligomer/POSS block structure hybrid material preparation methods 西安交通大学 2018-06-22 CN disclosed
CN-106463652-A Sealing material for electricity storage device 凸版印刷株式会社 2017-02-22 CN disclosed
EP-1954702-B1 RADIATION CURE SILICONE COMPOSITIONS Henkel IP & Holding GmbH (DE) 2016-09-28 EP disclosed
CN-104649916-A Photocrosslinkable Materials ROLIC AG 2015-05-27 CN disclosed
CN-103889944-A Photoalignment material ROLIC AG 2014-06-25 CN disclosed
JP-S60263949-A ELECTROCONDUCTIVE PAINT COMPOSITION CANON INC 1985-12-27 JP disclosed
US-4530992-A Reacting an aromatic compound, aldehyde and carboxylic acid IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1985-07-23 US disclosed
EP-0030969-B1 POLY(ETHYLENICALLY UNSATURATED ALKOXY)HETEROCYCLIC COMPOUNDS AND CROSSLINKED POLYMERIC COATINGS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1984-10-03 EP disclosed
US-4317862-A INTERMEDIATE PHOTSENSITIVE POLYMER LAYER BRIDGESTONE TIRE COMPANY LIMITED (JP) 1982-03-02 US disclosed
EP-0030969-A4 POLY(ETHYLENICALLY UNSATURATED ALKOXY)HETEROCYCLIC COMPOUNDS AND CROSSLINKED POLYMERIC COATINGS. MINNESOTA MINING & MFG (US) 1981-10-27 EP disclosed
EP-0030969-A1 POLY(ETHYLENICALLY UNSATURATED ALKOXY)HETEROCYCLIC COMPOUNDS AND CROSSLINKED POLYMERIC COATINGS. MINNESOTA MINING & MFG (US) 1981-07-01 EP disclosed
US-4249011-A CURING AGENTS FOR ADDITION PHOTOPOLYMERIZATION MINNESOTA MINING AND MANUFACTURING COMPANY 1981-02-03 US disclosed
WO-1981000011-A1 POLY(ETHYLENICALLY UNSATURATED ALKOXY)HETEROCYCLIC COMPOUNDS AND CROSSLINKED POLYMERIC COATINGS MINNESOTA MINING & MFG (US) 1981-01-08 WO disclosed
US-4163058-A ANTICONBULSANTS, ANTIEPLEPTICS, ANTIARRHYTHMICS INTERX RESEARCH CORPORATION (US) 1979-07-31 US disclosed