SCHEMBL4543063

SCHEMBL4543063

C=CC[C@H](O)C(=O)S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4079703 0.76
SCHEMBL5674658 0.76
SCHEMBL246812 0.76
SCHEMBL10524629 0.76 GRIK1 (0.45)
SCHEMBL17946581 0.74
SCHEMBL6449828 0.74
SCHEMBL2759244 0.74
SCHEMBL15760070 0.73
SCHEMBL11320112 0.73
SCHEMBL23496018 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3305539-B1 THERMOSENSITIVE RECORDING MATERIAL AND METHOD FOR PRODUCING SAME FUJIFILM CORP (JP) 2021-04-14 EP disclosed
US-10272708-B2 Thermosensitive recording material and method for manufacturing the same FUJIFILM CORPORATION (JP) 2019-04-30 US disclosed
EP-3305539-A1 THERMOSENSITIVE RECORDING MATERIAL AND METHOD FOR PRODUCING SAME FUJIFILM Corporation (JP) 2018-04-11 EP disclosed
US-20180043717-A1 THERMOSENSITIVE RECORDING MATERIAL AND METHOD FOR MANUFACTURING THE SAME FUJIFILM CORPORATION (JP) 2018-02-15 US disclosed
US-7576036-B2 Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material FUJIFILM CORPORATION (JP) 2009-08-18 US disclosed
US-7410744-B2 Recording method FUJIFILM CORPORATION (JP) 2008-08-12 US disclosed
US-20070128542-A1 Recording method FUJIFILM CORPORATION (JP) 2007-06-07 US disclosed
US-20070032381-A1 Heat-sensitive recording material, heat-sensitive recording method and method for manufacturing heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2007-02-08 US disclosed
US-20070004594-A1 Heat-sensitive recording material and heat-sensitive recording method FUJI PHOTO FILM CO., LTD. 2007-01-04 US disclosed
US-7153812-B2 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 2006-12-26 US disclosed
EP-1331104-A2 Heat sensitive recording material and recording method FUJI PHOTO FILM CO., LTD. (JP) 2003-07-30 EP disclosed
US-20030092572-A1 Heat sensitive recording material FUJI PHOTO FILM CO., LTD. 2003-05-15 US disclosed
US-20030077542-A1 Photopolymerizable composition, recording material and image forming method FUJI PHOTO FILM CO., LTD. 2003-04-24 US disclosed
EP-1297966-A2 Heat sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 2003-04-02 EP disclosed
US-20020126377-A1 Optical diffusion film and process of producing optical diffusion film FUJIFILM CORPORATION (JP) 2002-09-12 US disclosed
EP-1213600-A2 Optical diffusion film and process of producing optical diffusion film Fuji Photo Film Co., Ltd. (JP) 2002-06-12 EP disclosed
US-20020061820-A1 Heat-sensitive recording material and heat-sensitive recording process FUJI PHOTO FILM CO., LTD. 2002-05-23 US disclosed
US-6265344-B1 WHICH IS SUITABLE FOR A FILM FOR A VIDEO PRINTER. RICOH COMPANY, LTD. (JP) 2001-07-24 US disclosed
US-5661101-A Recording material FUJI PHOTO FILM CO., LTD. (JP) 1997-08-26 US disclosed
US-5514636-A Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1996-05-07 US disclosed