Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.33 |
| ▸ | FAAH | O00519 | 4/20 | 0.32 |
| ▸ | FDPS | P14324 | 3/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | CES1 | P23141 | 3/20 | 0.31 |
| ▸ | GPR84 | Q9NQS5 | 2/20 | 0.31 |
| ▸ | CES2 | O00748 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27552948 | 0.98 | MAPT (0.42) | MAPTOPRM1LMNADNM1FAAH | |
| SCHEMBL45230 | 0.98 | MAPT (0.42) | MAPTOPRM1LMNADNM1FAAH | |
| SCHEMBL45136 | 0.93 | DNM1 (0.35) | MAPTDNM1FDPSTSHR | |
| SCHEMBL31316959 | 0.85 | MAPT (0.39) | MAPTOPRM1LMNADNM1FAAH | |
| SCHEMBL2048920 | 0.83 | MAPT (0.38) | MAPTOPRM1LMNADNM1FAAH | |
| SCHEMBL9617190 | 0.82 | — | — | |
| SCHEMBL23825127 | 0.82 | MAPT (0.41) | MAPTOPRM1LMNAFAAHFDPS | |
| SCHEMBL8061303 | 0.82 | MAPT (0.36) | MAPTOPRM1LMNADNM1FAAH | |
| SCHEMBL23825044 | 0.82 | MAPT (0.41) | MAPTOPRM1LMNAFAAHFDPS | |
| SCHEMBL3010559 | 0.82 | MAPT (0.41) | MAPTOPRM1LMNAFAAHFDPS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110527326-A | A kind of aeroge coating and preparation method thereof | TANG XUEJIN | 2019-12-03 | — | — | CN | claimed |
| CN-107619467-B | Alternate copolymerization method for preparing fluorine-containing polymer based on dibromide compound and diene monomer | 苏州大学 | 2019-06-25 | — | — | CN | claimed |
| CN-107619467-A | Alternate copolymerization method for preparing fluorine-containing polymer based on dibromide compound and diene monomer | 苏州大学 | 2018-01-23 | — | — | CN | claimed |
| CN-101381693-A | Controllable high-efficiency microorganism growth medium/liquid and preparation method thereof | XIANGHAI CHEN (CN) | 2009-03-11 | — | — | CN | claimed |
| CN-107667415-B | Conformal peelable carbon films for advanced patterning with reduced line edge roughness | 应用材料公司 | 2021-10-26 | — | — | CN | disclosed |
| CN-110527326-A | A kind of aeroge coating and preparation method thereof | TANG XUEJIN | 2019-12-03 | — | — | CN | disclosed |
| CN-107619467-B | Alternate copolymerization method for preparing fluorine-containing polymer based on dibromide compound and diene monomer | 苏州大学 | 2019-06-25 | — | — | CN | disclosed |
| CN-107033297-B | Siliceous hyper branched polymer and solidification compound containing the polymer | 日产化学工业株式会社 | 2019-04-30 | — | — | CN | disclosed |
| CN-108699694-A | Include the electroless plating substrate agent of highly -branched macromolecule and metal particle | 日产化学株式会社 | 2018-10-23 | — | — | CN | disclosed |
| US-10074534-B2 | Ultra-conformal carbon film deposition | APPLIED MATERIALS, INC. (US) | 2018-09-11 | — | — | US | disclosed |
| US-10014174-B2 | Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning | APPLIED MATERIALS, INC. (US) | 2018-07-03 | — | — | US | disclosed |
| CN-107619467-A | Alternate copolymerization method for preparing fluorine-containing polymer based on dibromide compound and diene monomer | 苏州大学 | 2018-01-23 | — | — | CN | disclosed |
| US-20050287771-A1 | Liquid precursors for the CVD deposition of amorphous carbon films | APPLIED MATERIALS, INC. | 2005-12-29 | — | — | US | disclosed |
| CN-1220666-C | Monomer containing electron drawing group and electron donating group and polymer and proton conductive membrane containing same | JSR CORP (JP) | 2005-09-28 | — | — | CN | disclosed |
| WO-2005087974-A2 | CVD PROCESSES FOR THE DEPOSITION OF AMORPHOUS CARBON FILMS | APPLIED MATERIALS, INC. (US) | 2005-09-22 | — | — | WO | disclosed |
| CN-1154684-C | Process for producing surface-modified rubber surface-modified rubberand sealing material thereof | �ձ�������ҵ��ʽ���� | 2004-06-23 | — | — | CN | disclosed |
| CN-1379009-A | Monomer containing electron drawing group and electron donating group and polymer and proton conductive membrane containing same | JSR CORP (JP) | 2002-11-13 | — | — | CN | disclosed |
| CN-1213389-A | Process for producing surface-modified rubber surface-modified rubberand sealing material thereof | NIHON VALQUA KOGYO KK (JP) | 1999-04-07 | — | — | CN | disclosed |
| US-4910041-A | Generated arced plasma; applying a magnetic field | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-03-20 | — | — | US | disclosed |
| US-4693799-A | LOW TEMPERATURE PULSE DISCHARGING | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-09-15 | — | — | US | disclosed |