Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2612694 | 0.92 | ALDH1A1 (0.39) | TSHRTDP1ALDH1A1 | |
| SCHEMBL17297801 | 0.89 | ALDH1A1 (0.43) | TSHRTDP1ALDH1A1 | |
| SCHEMBL21413004 | 0.89 | ALDH1A1 (0.38) | TSHRTDP1ALDH1A1 | |
| SCHEMBL13453979 | 0.87 | TSHR (0.36) | TSHRTDP1ALDH1A1 | |
| SCHEMBL19389597 | 0.86 | ALDH1A1 (0.39) | TSHRTDP1ALDH1A1 | |
| SCHEMBL6444315 | 0.84 | ALDH1A1 (0.38) | TSHRTDP1ALDH1A1 | |
| SCHEMBL22221689 | 0.84 | ALDH1A1 (0.38) | TSHRTDP1ALDH1A1 | |
| SCHEMBL2517343 | 0.84 | ALDH1A1 (0.38) | TSHRTDP1ALDH1A1 | |
| SCHEMBL12318010 | 0.83 | ALDH1A1 (0.33) | TSHRTDP1ALDH1A1 | |
| SCHEMBL9750838 | 0.81 | TSHR (0.45) | TSHRTDP1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130065183-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-14 | — | — | US | disclosed |
| US-20120214100-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20120183893-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120135350-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| US-8182980-B2 | Good in developability, staining resistance and dispersibility of photosensitive layer in the developing solution | FUJIFILM CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-20100167207-A1 | Chemically amplified positive resist composition and resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20080241739-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR PREPARING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20070184387-A1 | Method for preparation of lithographic printing plate and lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2007-08-09 | — | — | US | disclosed |
| US-20070020563-A1 | Method for preparation of lithographic printing plate and lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. | 2007-01-25 | — | — | US | disclosed |