SCHEMBL4547618

SCHEMBL4547618

CCCCOCC(COC)OC

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRKD3 O94806 2/20 0.56
PRKCG P05129 2/20 0.56
PRKCB P05771 2/20 0.56
PRKCA P17252 2/20 0.56
PRKCH P24723 2/20 0.56
PRKCI P41743 2/20 0.56
PRKCE Q02156 2/20 0.56
PRKCQ Q04759 2/20 0.56
PRKCZ Q05513 2/20 0.56
PRKCD Q05655 2/20 0.56
PRKD1 Q15139 2/20 0.56
LPAR1 Q92633 9/20 0.55
LPAR3 Q9UBY5 9/20 0.55
LPAR2 Q9HBW0 4/20 0.55
LPAR6 P43657 3/20 0.55
LPAR4 Q99677 3/20 0.55
LPAR5 Q9H1C0 3/20 0.55
TSHR P16473 1/20 0.46
USP2 O75604 1/20 0.45
AKT1 P31749 3/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14007343 1.00 PRKD3 (0.56) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL13711953 0.95 PRKD3 (0.60) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL14843018 0.93 PRKD3 (0.65) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL14842644 0.91 PRKD3 (0.68) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL18519898 0.91 PRKD3 (0.68) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL14843034 0.91 PRKD3 (0.68) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL7032675 0.91 PRKD3 (0.68) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL4547608 0.88 PRKD3 (0.48) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL19668142 0.86 USP2 (0.52) PRKD3PRKCGPRKCBPRKCAPRKCH
SCHEMBL5765995 0.86 USP2 (0.52) PRKD3PRKCGPRKCBPRKCAPRKCH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9627204-B2 Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-18 US disclosed
US-9580623-B2 Patterning process using a boron phosphorus silicon glass film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-02-28 US disclosed
EP-2599819-B1 Silicon-containing resist underlayer film-forming composition and patterning process SHINETSU CHEMICAL CO (JP) 2017-02-01 EP disclosed
US-9535215-B2 Fluorinated sol-gel low refractive index hybrid optical cladding and electro-optic devices made therefrom BRPHOTONICS PRODUCTOS OPTOELECTRONICOS LTDA. (BR) 2017-01-03 US disclosed
US-20160276152-A1 PATTERNING PROCESS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2016-09-22 US disclosed
US-20160096978-A1 COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-07 US disclosed
US-9090502-B2 Nanoimprint-mold release agent, surface treatment method, and nanoimprint mold SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-28 US disclosed
US-9075309-B2 Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-07 US disclosed
US-9069247-B2 Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-30 US disclosed
US-8992790-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-03-31 US disclosed
US-20130210229-A1 SILICON-CONTAINING SURFACE MODIFIER, RESIST LOWER LAYER FILM-FORMING COMPOSITION CONTAINING THE SAME, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-15 US disclosed
US-20130210236-A1 SILICON-CONTAINING SURFACE MODIFIER, RESIST UNDERLAYER FILM COMPOSITION CONTAINING THIS, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-15 US disclosed
US-8501386-B2 Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-06 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
WO-2013050718-A1 METHOD FOR PREPARING GLYCEROL DERIVATIVES, USE THEREOF, AND COMPOSITION INCLUDING SAID GLYCEROL DERIVATIVES FOND DE DEVELOPPEMENT DES FILIERES DES OLEAGINEUX ET PROTEAGINEUX (FIDOP) (FR) 2013-04-11 WO disclosed
US-20130004137-A1 FLUORINATED SOL-GEL LOW REFRACTIVE INDEX HYBRID OPTICAL CLADDING AND ELECTRO-OPTIC DEVICES MADE THEREFROM GIGOPTIX, INC. (US) 2013-01-03 US disclosed
US-20120264964-A1 ALKOXYSILANE COMPOUNDS HAVING FLUOROALKYL GROUP AND METHOD OF PREPARING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-10-18 US disclosed
US-20120263816-A1 NANOIMPRINT-MOLD RELEASE AGENT, SURFACE TREATMENT METHOD, AND NANOIMPRINT MOLD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-10-18 US disclosed
US-20120108512-A1 STABLE PHARMACEUTICAL COMPOSITIONS OF PEPTIDE DERIVATIZED USING AN OXIME LINKER NOVO NORDISK HEALTH CARE AG (CH) 2012-05-03 US disclosed
WO-1990011075-A1 ANGIOGENIC MONOBUTYRIN AND ITS ANALOGS DANA FARBER CANCER INSTITUTE (US) 1990-10-04 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120263816-A1 NANOIMPRINT-MOLD RELEASE AGENT, SURFACE TREATMENT METHOD, AND NANOIMPRINT MOLD ERG28, CYP51A1, PRMT1 PRKD3 2790/4885PRKCG 1864/4885PRKCB 2465/4885
US-20120264964-A1 ALKOXYSILANE COMPOUNDS HAVING FLUOROALKYL GROUP AND METHOD OF PREPARING THE SAME RFC1, AFF1, PCNA PRKD3 1683/4885PRKCG 2325/4885PRKCB 1988/4885
US-20130210229-A1 SILICON-CONTAINING SURFACE MODIFIER, RESIST LOWER LAYER FILM-FORMING COMPOSITION CONTAINING THE SAME, AND PATTERNING PROCESS SIGLEC9, SIGLEC7, EPCAM PRKD3 4695/4885PRKCG 3929/4885PRKCB 4114/4885
US-20120108512-A1 STABLE PHARMACEUTICAL COMPOSITIONS OF PEPTIDE DERIVATIZED USING AN OXIME LINKER PTMS, NGLY1, IAPP PRKD3 3027/4885PRKCG 3835/4885PRKCB 4358/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.