Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL284757 | 0.87 | NUDT1 (0.34) | NUDT1 | |
| SCHEMBL10014829 | 0.84 | — | — | |
| SCHEMBL283947 | 0.84 | TSHR (0.37) | NUDT1 | |
| SCHEMBL284223 | 0.84 | TSHR (0.37) | NUDT1 | |
| SCHEMBL12918953 | 0.82 | — | — | |
| SCHEMBL12918948 | 0.82 | — | — | |
| SCHEMBL14444920 | 0.81 | — | — | |
| SCHEMBL3435267 | 0.80 | HTT (0.30) | HTT | |
| SCHEMBL6032267 | 0.79 | NUDT1 (0.32) | NUDT1 | |
| SCHEMBL14707578 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9676929-B2 | Employing polyalkylene oxides for nucleation in aqueous polymerization of fluoromonomer | THE CHEMOURS COMPANY FC, LLC (US) | 2017-06-13 | — | — | US | disclosed |
| US-9574027-B2 | Fluoropolymer resin treatment employing sorbent to reduce fluoropolymer resin discoloration | THE CHEMOURS COMPANY FC, LLC (US) | 2017-02-21 | — | — | US | disclosed |
| US-9371405-B2 | Nucleation in aqueous polymerization of fluoromonomer | THE CHEMOURS COMPANY FC, LLC (US) | 2016-06-21 | — | — | US | disclosed |
| US-20150344592-A1 | FLUOROPOLYMER DISPERSION TREATMENT EMPLOYING OXIDIZING AGENT TO REDUCE FLUOROPOLYMER RESIN DISCOLORATION | JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT | 2015-12-03 | — | — | US | disclosed |
| US-9175115-B2 | Fluoropolymer resin treatment employing heating and oxygen source to reduce discoloration | THE CHEMOURS COMPANY FC, LLC (US) | 2015-11-03 | — | — | US | disclosed |
| US-9175112-B2 | Drying wet fluoropolymer resin and exposing to oxygen source to reduce discoloration | THE CHEMOURS COMPANY FC, LLC (US) | 2015-11-03 | — | — | US | disclosed |
| US-9175110-B2 | Fluoropolymer resin treatment employing melt extrusion and exposure to oxygen source to reduce discoloration | THE CHEMOURS COMPANY FC, LLC (US) | 2015-11-03 | — | — | US | disclosed |
| US-9074025-B2 | Reducing the telogenic behavior of hydrocarbon-containing surfactants in aqueous dispersion fluoromonomer polymerization | THE CHEMOURS COMPANY FC, LLC (US) | 2015-07-07 | — | — | US | disclosed |
| WO-2015081055-A1 | EMPLOYING POLYALKYLENE OXIDES FOR NUCLEATION IN AQUEOUS POLYMERIZATION OF FLUOROMONOMER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2015-06-04 | — | — | WO | disclosed |
| US-20150148481-A1 | EMPLOYING POLYALKYLENE OXIDES FOR NUCLEATION IN AQUEOUS POLYMERIZATION OF FLUOROMONOMER | JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT | 2015-05-28 | — | — | US | disclosed |
| US-20130303710-A1 | Fluoropolymer Dispersion Treatment Employing Hydrogen Peroxide to Reduce Fluoropolymer Resin Discoloration | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-11-14 | — | — | US | disclosed |
| US-20130303650-A1 | FLUOROPOLYMER DISPERSION TREATMENT EMPLOYING ULTRAVIOLET LIGHT AND OXYGEN SOURCE TO REDUCE FLUOROPOLYMER RESIN DISCOLORATION | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-11-14 | — | — | US | disclosed |
| US-8563670-B2 | Nucleation in aqueous polymerization of fluoromonomer | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-10-22 | — | — | US | disclosed |
| US-20120116015-A1 | Reducing the Telogenic Behavior of Hydrocarbon-Containing Surfactants in Aqueous Dispersion Fluoromonomer Polymerization | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-05-10 | — | — | US | disclosed |
| US-20120116017-A1 | Nucleation in Aqueous Polymerization of Fluoromonomer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-05-10 | — | — | US | disclosed |
| US-7989137-B2 | Resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2011-08-02 | — | — | US | disclosed |
| US-7811740-B2 | comprising acrylate resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, and a surfactant containing a fluorine compound or fluorine containing polyethers; resist pattern with good sensitivity, resolution, adhesion, and little in development defects; for an immersion exposure | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-7662481-B2 | Endless belt for electrophotographic apparatus | TOKAI RUBBER INDUSTRIES, LTD. (JP) | 2010-02-16 | — | — | US | disclosed |
| US-20090087789-A1 | RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20080050675-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-02-28 | — | — | US | disclosed |