SCHEMBL4554173

SCHEMBL4554173

CC(C)CCNF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20365969 0.79
SCHEMBL20810407 0.72 LMNA (0.34)
SCHEMBL40975 0.72 LMNA (0.35)
SCHEMBL3296405 0.69 LMNA (0.33)
SCHEMBL12976429 0.69 LMNA (0.33)
SCHEMBL388479 0.69
SCHEMBL20234221 0.69
SCHEMBL7776935 0.69
Methane SCHEMBL4915158 0.67 LMNA (0.32)
SCHEMBL5810192 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2064069-A1 COATING COMPOSITION FOR FORMING A LASER-MARKABLE MATERIAL AND A LASER-MARKABLE MATERIAL FUJI HUNT PHOTOGRAPHIC CHEMICALS, INC. (US) 2009-06-03 EP disclosed
WO-2007114829-A1 COATING COMPOSITION FOR FORMING A LASER-MARKABLE MATERIAL AND A LASER-MARKABLE MATERIAL FUJI HUNT PHOTOGRAPHIC CHEMICALS, INC. (US) 2007-10-11 WO disclosed
US-20070098900-A1 Media providing non-contacting formation of high contrast marks and method of using same, composition for forming a laser-markable coating, a laser-markable material and process of forming a marking FUJI HUNT PHOTOGRAPHIC CHEMICALS, INC. 2007-05-03 US disclosed