⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL964294 | 0.77 | — | — | |
| SCHEMBL169501 | 0.77 | ALDH1A1 (0.41) | — | |
| Hydrochloric Acid SCHEMBL1235584 | 0.75 | ALDH1A1 (0.39) | — | |
| Ammonia Solution, Strong SCHEMBL10418578 | 0.75 | ALDH1A1 (0.39) | — | |
| SCHEMBL10716104 | 0.75 | — | — | |
| SCHEMBL84531 | 0.70 | — | — | |
| SCHEMBL156789 | 0.70 | TSHR (0.34) | — | |
| SCHEMBL10585151 | 0.69 | — | — | |
| SCHEMBL14645902 | 0.69 | TSHR (0.34) | — | |
| SCHEMBL10893404 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8211613-B2 | prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-7528205-B2 | Photo radical generator, photo sensitive resin composition and article | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-05-05 | — | — | US | disclosed |
| US-20080275154-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | SAKAYORI KATSUYA | 2008-11-06 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |
| US-20050119432-A1 | Photo radical generator, photo sensitive resin composition and article | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-06-02 | — | — | US | disclosed |
| US-20040023159-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-02-05 | — | — | US | disclosed |