Serine

Serine

SCHEMBL4562562

C=C(C)C(N)=O.N[C@@H](CO)C(=O)O

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 1/20 0.52
▸ GRIK1 P39086 3/20 0.43
▸ SLC1A1 P43005 3/20 0.43
▸ GRIK2 Q13002 2/20 0.43
▸ GRM1 Q13255 1/20 0.43
▸ GRM2 Q14416 1/20 0.43
▸ TGFBR1 P36897 1/20 0.42
▸ SLC7A5 Q01650 1/20 0.41
▸ NOS2 P35228 6/20 0.40
▸ NOS1 P29475 5/20 0.40
▸ NOS3 P29474 4/20 0.40
▸ KMT2A Q03164 2/20 0.40
▸ BLM P54132 2/20 0.40
▸ MEN1 O00255 1/20 0.40
▸ CYP2C19 P33261 1/20 0.40
▸ ALOX15 P16050 1/20 0.40
▸ PMP22 Q01453 1/20 0.40
▸ PTGS1 P23219 1/20 0.39
▸ SLC7A11 Q9UPY5 1/20 0.39
▸ CYP1A2 P05177 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Serine SCHEMBL28752291 1.00 TDP1 (0.52) TDP1GRIK1SLC1A1GRIK2GRM1
Serine SCHEMBL4946751 0.89 GRIK1 (0.50) GRIK1SLC1A1GRIK2GRM1GRM2
Serine SCHEMBL21988620 0.89 GRIK1 (0.50) GRIK1SLC1A1GRIK2GRM1GRM2
Serine SCHEMBL7051757 0.89 GRIK1 (0.48) GRIK1SLC1A1GRIK2GRM1GRM2
Serine SCHEMBL29013386 0.86 SLC1A1 (0.50) GRIK1SLC1A1GRIK2GRM1GRM2
Serine SCHEMBL2509471 0.84 SLC1A1 (0.52) GRIK1SLC1A1GRIK2GRM1GRM2
Serine SCHEMBL2166436 0.84 SLC1A1 (0.52) GRIK1SLC1A1GRIK2GRM1GRM2
Serine SCHEMBL2166438 0.84 SLC1A1 (0.52) GRIK1SLC1A1GRIK2GRM1GRM2
Serine SCHEMBL25336671 0.82 GRIK1 (0.52) GRIK1SLC1A1GRIK2GRM1GRM2
Serine SCHEMBL28227342 0.81 SLC1A1 (0.50) GRIK1SLC1A1GRIK2GRM1GRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7534547-B2 Optically active compound and photosensitive resin composition OSAKA GAS COMPANY LIMITED (JP) 2009-05-19 — — US disclosed
EP-0850955-B1 Method of producing a copolymer FUJIFILM CORP (JP) 2008-03-19 — — EP disclosed
EP-1522554-B1 Polyacetal resin composition and shaped article thereof POLYPLASTICS CO (JP) 2006-11-22 — — EP disclosed
US-6921623-B2 Active components and photosensitive resin composition containing the same KRI, INC. (JP) 2005-07-26 — — US disclosed
EP-1522554-A1 Polyacetal resin composition and shaped article thereof Polyplastics Co., Ltd. (JP) 2005-04-13 — — EP disclosed
EP-1375463-A1 OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Kansai Research Institute, Inc. (JP) 2004-01-02 — — EP disclosed
US-6653043-B1 Mixtures of photoresists, sensitizers and active materials such as silica sol modified by resorcin coupled to silanes, used to improve sensitivity and resolution KANSAI RESEARCH INSTITUTE, INC. (JP) 2003-11-25 — — US disclosed
US-20030211421-A1 Optically active compound and photosensitive resin composition KRI, INC. (JP) 2003-11-13 — — US disclosed
EP-0965885-B1 INORGANIC-CONTAINING PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING INORGANIC PATTERN KANSAI RES INST (JP) 2003-10-01 — — EP disclosed
US-6599998-B1 Producing a copolymer by polymerizing at least two monomers having different reactivity as constitutional components, comprising carrying out a polymerization while adding a monomer component B having high reactivity, to a solution of FUJI PHOTO FILM CO., LTD. (JP) 2003-07-29 — — US disclosed
US-20030064320-A1 Active components and photosensitive resin composition containing the same KRI, INC. (JP) 2003-04-03 — — US disclosed
US-6534235-B1 Photosensitive resin and inorganic particles having a functional group obtained by a reaction between inorganic particles and a coupling agent KANSAI RESEARCH INSTITUTE, INC. (JP) 2003-03-18 — — US disclosed
EP-1265103-A1 ACTIVE COMPONENTS AND PHOTOSENSITIVE RESIN COMPOSITIONS CONTAINING THE SAME Kansai Research Institute, Inc. (JP) 2002-12-11 — — EP disclosed
EP-1096313-A1 Active particle, photosensitive resin composition, and process for forming pattern Kansai Research Institute, Inc. (JP) 2001-05-02 — — EP disclosed
US-6183935-B1 FOR FORMING MINUTE INORGANIC PATTERN; RESOLUTION, SENSITIVITY, ASPECT RATIO, KANSAI RESEARCH INSTITUTE (JP) 2001-02-06 — — US disclosed
EP-0965885-A1 INORGANIC-CONTAINING PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING INORGANIC PATTERN Kansai Research Institute (JP) 1999-12-22 — — EP disclosed
EP-0850955-A2 Method of producing a copolymer Fuji Photo Film Co., Ltd. (JP) 1998-07-01 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030211421-A1 Optically active compound and photosensitive resin composition ARCN1, RAD51, PAM TDP1 2771/4885GRIK1 140/4885SLC1A1 2203/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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