⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28034402 | 1.00 | — | — | |
| Butane SCHEMBL2058367 | 0.82 | — | — | |
| SCHEMBL7592618 | 0.73 | — | — | |
| SCHEMBL2924932 | 0.59 | — | — | |
| SCHEMBL457555 | 0.58 | — | — | |
| Trimethylammonium SCHEMBL284438 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL5310222 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL5582 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL13989274 | 0.53 | — | — | |
| Trimethylammonium SCHEMBL1331060 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 6215 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4743602-A1 | FORMULATIONS FOR SELECTIVE DEPOSITION | Merck Patent GmbH (DE) | 2026-05-20 | — | — | EP | claimed |
| US-20260136855-A1 | METHOD OF SELECTIVE DEPOSITION ON SUBSTRATE, SUBSTRATE FABRICATED THEREBY, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE COMPRISING SAME | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-05-14 | — | — | US | claimed |
| US-12628400-B2 | Seam free titanium nitride gapfill | APPLIED MATERIALS, INC. (US) | 2026-05-12 | — | — | US | claimed |
| US-12612703-B2 | Method for providing a substrate for an electrochemical cell with a catalytic material | NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO (NL) | 2026-04-28 | — | — | US | claimed |
| EP-4722411-A1 | A SEMICONDUCTOR MANUFACTURING APPARATUS AND A METHOD FOR MANUFACTURING OF A SEMICONDUCTOR | ASM IP Holding B.V. (NL) | 2026-04-08 | — | — | EP | claimed |
| US-20260096150-A1 | TRANSISTOR, METHOD OF MANUFACTURING TRANSISTOR, AND ELECTRONIC DEVICE INCLUDING TRANSISTOR | SAMSUNG DISPLAY CO LTD (KR) | 2026-04-02 | — | — | US | claimed |
| US-20260085413-A1 | SEMICONDUCTOR MANUFACTURING APPARATUS AND A METHOD FOR MANUFACTURING OF A SEMICONDUCTOR | ASM IP HOLDING BV (NL) | 2026-03-26 | — | — | US | claimed |
| US-20260041086-A1 | PROCESS FOR PREPARING COATED ORGANIC PARTICLES | BASF SE (DE) | 2026-02-12 | — | — | US | claimed |
| EP-4690275-A1 | PROTECTIVE CAPPING LAYER FOR AREA SELECTIVE DEPOSITION | Applied Materials, Inc. (US) | 2026-02-11 | — | — | EP | claimed |
| EP-4688204-A1 | ATOMIC LAYER DEPOSITION OF FILTRATION MEDIA | Donaldson Company, Inc. (US) | 2026-02-11 | — | — | EP | claimed |
| EP-0503001-A4 | PROCESS FOR CHEMICAL VAPOR DEPOSITION OF TRANSITION METAL NITRIDES | — | 1993-06-23 | — | — | EP | claimed |
| EP-0293439-B1 | SEMI-INSULATING GROUP III-V BASED COMPOSITIONS | AT&T Corp. (US) | 1993-04-21 | — | — | EP | claimed |
| US-5192589-A | Low-pressure chemical vapor deposition process for depositing thin titanium nitride films having low and stable resistivity | MICRON TECHNOLOGY, INC. (US) | 1993-03-09 | — | — | US | claimed |
| EP-0509233-A2 | Process for producing ethylene-alpha-olefin copolymers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-21 | — | — | EP | claimed |
| EP-0503001-A1 | PROCESS FOR CHEMICAL VAPOR DEPOSITION OF TRANSITION METAL NITRIDES. | HARVARD COLLEGE (US) | 1992-09-16 | — | — | EP | claimed |
| US-5139825-A | PROCESS FOR CHEMICAL VAPOR DEPOSITION OF TRANSITION METAL NITRIDES | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 1992-08-18 | — | — | US | claimed |
| US-5104690-A | Chemical vapor deposition of ferroelectric material | SPIRE CORPORATION (US) | 1992-04-14 | — | — | US | claimed |
| WO-1991008322-A1 | PROCESS FOR CHEMICAL VAPOR DEPOSITION OF TRANSITION METAL NITRIDES | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 1991-06-13 | — | — | WO | claimed |
| EP-0077279-B1 | PROCESS FOR THE PREPARATION OF ORTHOHYDROXYBENZALDEHYDES | RHONE-POULENC CHIMIE (FR) | 1988-09-07 | — | — | EP | claimed |
| EP-0174743-A2 | Process for transition metal nitrides thin film deposition | MORTON THIOKOL, INC. (US) | 1986-03-19 | — | — | EP | claimed |