⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28034402 | 0.82 | — | — | |
| SCHEMBL45685 | 0.82 | — | — | |
| Butane SCHEMBL7064528 | 0.71 | TSHR (0.36) | — | |
| Butane SCHEMBL27311306 | 0.71 | — | — | |
| SCHEMBL2121122 | 0.69 | — | — | |
| Butane SCHEMBL27863151 | 0.67 | DNM1 (0.33) | — | |
| Butane SCHEMBL7707919 | 0.67 | — | — | |
| Butane SCHEMBL27863150 | 0.67 | DNM1 (0.33) | — | |
| Butane SCHEMBL8628663 | 0.65 | TSHR (0.50) | — | |
| Butane SCHEMBL3593 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8313804-B2 | Apparatus and methods for chemical vapor deposition | APPLIED MATERIALS, INC. (US) | 2012-11-20 | — | — | US | disclosed |
| US-20110217466-A1 | APPARATUS AND METHODS FOR CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2011-09-08 | — | — | US | disclosed |
| US-7967911-B2 | Apparatus and methods for chemical vapor deposition | APPLIED MATERIALS, INC. (US) | 2011-06-28 | — | — | US | disclosed |
| US-20080014350-A1 | Apparatus and Methods for Chemical Vapor Deposition | APPLIED MATERIALS, INC. | 2008-01-17 | — | — | US | disclosed |
| WO-2007121202-A1 | APPARATUS AND METHODS FOR CHEMICAL VAPOR DEPOSITION | APPLIED MATERIALS, INC. (US) | 2007-10-25 | — | — | WO | disclosed |
| US-7055808-B2 | Vaporizing reactant liquids for chemical vapor deposition film processing | APPLIED MATERIALS (US) | 2006-06-06 | — | — | US | disclosed |
| US-7055809-B2 | Vaporizing reactant liquids for chemical vapor deposition film processing | APPLIED MATERIALS (US) | 2006-06-06 | — | — | US | disclosed |
| US-20040188866-A1 | Vaporizing reactant liquids for chemical vapor deposition film processing | SIVARAMAKRISHNAN VISWESWAREN (US) | 2004-09-30 | — | — | US | disclosed |
| US-6783118-B2 | Vaporizing reactant liquids for chemical vapor deposition film processing | APPLIED MATERIALS INC. | 2004-08-31 | — | — | US | disclosed |
| US-20030226505-A1 | Vaporizing reactant liquids for chemical vapor deposition film processing | SIVARAMAKRISHNAN VISWESWAREN (US) | 2003-12-11 | — | — | US | disclosed |
| US-6596085-B1 | Methods and apparatus for improved vaporization of deposition material in a substrate processing system | APPLIED MATERIALS, INC. | 2003-07-22 | — | — | US | disclosed |
| US-20020014207-A1 | Vaporizing reactant liquids for chemical vapor deposition film processing | SIVARAMAKRISHNAN VISWESWAREN (US) | 2002-02-07 | — | — | US | disclosed |
| EP-1122335-A1 | Methods and apparatus for vaporization of liquids | Applied Materials, Inc. (US) | 2001-08-08 | — | — | EP | disclosed |
| US-6224681-B1 | Vaporizing reactant liquids for chemical vapor deposition film processing | APPLIED MATERIALS, INC. | 2001-05-01 | — | — | US | disclosed |
| EP-0602595-B1 | Vaporizing reactant liquids for CVD | APPLIED MATERIALS INC (US) | 1997-07-23 | — | — | EP | disclosed |
| EP-0602595-A1 | Vaporizing reactant liquids for CVD | APPLIED MATERIALS, INC. (US) | 1994-06-22 | — | — | EP | disclosed |