Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.49 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
| ▸ | SRC | P12931 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.42 |
| ▸ | DPP4 | P27487 | 1/20 | 0.41 |
| ▸ | CES2 | O00748 | 1/20 | 0.41 |
| ▸ | CES1 | P23141 | 1/20 | 0.41 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.41 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.41 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.41 |
| ▸ | MME | P08473 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15342224 | 1.00 | CYP3A4 (0.49) | CYP3A4CYP2D6SRCHPGDLMNA | |
| SCHEMBL7787872 | 0.84 | CYP2D6 (0.52) | CYP3A4CYP2D6SRCHPGDLMNA | |
| SCHEMBL585192 | 0.84 | CYP2D6 (0.52) | CYP3A4CYP2D6SRCHPGDLMNA | |
| SCHEMBL28842374 | 0.84 | CYP2D6 (0.46) | CYP2D6SRCLMNAKMT2AMAPK1 | |
| SCHEMBL6724975 | 0.82 | CYP2D6 (0.44) | CYP2D6SRCLMNAKMT2AMAPK1 | |
| SCHEMBL6689864 | 0.82 | CYP2D6 (0.44) | CYP3A4CYP2D6SRCHPGDLMNA | |
| SCHEMBL10131915 | 0.80 | CYP2D6 (0.54) | CYP3A4CYP2D6SRCHPGDLMNA | |
| SCHEMBL4443964 | 0.80 | LMNA (0.54) | CYP3A4CYP2D6HPGDLMNAKMT2A | |
| SCHEMBL25896588 | 0.80 | LMNA (0.54) | CYP3A4CYP2D6HPGDLMNAKMT2A | |
| SCHEMBL25896593 | 0.80 | LMNA (0.54) | CYP3A4CYP2D6HPGDLMNAKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9696622-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-04 | — | — | US | disclosed |
| US-9696627-B2 | Compositions comprising base-reactive component and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-04 | — | — | US | disclosed |
| US-9563128-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-02-07 | — | — | US | disclosed |
| US-9507260-B2 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-11-29 | — | — | US | disclosed |
| US-9436082-B2 | Compositions comprising base-reactive component and processes for photolithography | ROHM AND HAAS ELECTRONICS MATERIALS LLC (US) | 2016-09-06 | — | — | US | disclosed |
| US-20160070172-A1 | COMPOSITIONS COMPRISING SULFONAMIDE MATERIAL AND PROCESSES FOR PHOTOLITHOGRAPHY | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-03-10 | — | — | US | disclosed |
| US-9274427-B2 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-03-01 | — | — | US | disclosed |
| WO-2016028571-A2 | DIPEPTIDOMIMETICS AS INHIBITORS OF HUMAN IMMUNOPROTEASOMES | CORNELL UNIVERSITY (US) | 2016-02-25 | — | — | WO | disclosed |
| US-9244355-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) | 2016-01-26 | — | — | US | disclosed |
| US-20150378255-A1 | COMPOSITIONS COMPRISING CARBOXY COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2015-12-31 | — | — | US | disclosed |
| US-7498115-B2 | Photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-03-03 | — | — | US | disclosed |
| US-20080220597-A1 | Photoresists and methods for use thereof | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-09-11 | — | — | US | disclosed |
| US-20080193872-A1 | Applying on photoresist, a photoactive component, and material(s) having a water contact angle changeable by base treatment; activation by immersion exposing to radiation; reduced leaching; pentafluoroacrylate-ethyl cyclopentyl methacrylate-trimethylolpropane triacrylate terpolymer | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-08-14 | — | — | US | disclosed |
| US-7326518-B2 | Photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-02-05 | — | — | US | disclosed |
| US-7297616-B2 | Methods, photoresists and substrates for ion-implant lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-11-20 | — | — | US | disclosed |
| US-20070212646-A1 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-09-13 | — | — | US | disclosed |
| US-20070160930-A1 | Coating compositions for photoresists | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-07-12 | — | — | US | disclosed |
| US-20070087286-A1 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-04-19 | — | — | US | disclosed |
| US-20070072112-A1 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-03-29 | — | — | US | disclosed |
| US-7183037-B2 | Antireflective coatings with increased etch rates | SHIPLEY COMPANY, L.L.C. (US) | 2007-02-27 | — | — | US | disclosed |