Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FAAH | O00519 | 6/20 | 0.55 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.55 |
| ▸ | CASP2 | P42575 | 1/20 | 0.53 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.51 |
| ▸ | CNR1 | P21554 | 2/20 | 0.50 |
| ▸ | CNR2 | P34972 | 2/20 | 0.50 |
| ▸ | NAAA | Q02083 | 1/20 | 0.50 |
| ▸ | SLC6A5 | Q9Y345 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14589614 | 1.00 | FAAH (0.55) | FAAHEPHX2CASP2DNM1KDM4E | |
| Pendecamaine SCHEMBL8441552 | 1.00 | FAAH (0.55) | FAAHEPHX2CASP2DNM1KDM4E | |
| SCHEMBL6751349 | 1.00 | FAAH (0.55) | FAAHEPHX2CASP2DNM1KDM4E | |
| SCHEMBL13133329 | 1.00 | FAAH (0.55) | FAAHEPHX2CASP2DNM1KDM4E | |
| SCHEMBL6751347 | 1.00 | FAAH (0.55) | FAAHEPHX2CASP2DNM1KDM4E | |
| SCHEMBL8438559 | 1.00 | FAAH (0.55) | FAAHEPHX2CASP2DNM1KDM4E | |
| SCHEMBL103617 | 1.00 | FAAH (0.55) | FAAHEPHX2CASP2DNM1KDM4E | |
| SCHEMBL12939017 | 1.00 | FAAH (0.55) | FAAHEPHX2CASP2DNM1KDM4E | |
| SCHEMBL5466090 | 1.00 | FAAH (0.55) | FAAHEPHX2CASP2DNM1KDM4E | |
| SCHEMBL14589613 | 1.00 | FAAH (0.55) | FAAHEPHX2CASP2DNM1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3728487-B1 | METHOD OF REMOVING POLYMERIC MATERIAL COMPRISING HETEROATOMS FROM A SURFACE USING COMPOSITIONS INCLUDING A KETO-ESTER COMPOUND | FOURTH PRINCIPLE LLC (US) | 2025-07-02 | — | — | EP | disclosed |
| US-11370996-B2 | Compositions including keto-ester compounds and methods of using the same | FOURTH PRINCIPLE, LLC (US) | 2022-06-28 | — | — | US | disclosed |
| US-20200377823-A1 | COMPOSITIONS INCLUDING KETO-ESTER COMPOUNDS AND METHODS OF USING THE SAME | TALK ABOUT IT SOLUTIONS | 2020-12-03 | — | — | US | disclosed |
| EP-3728487-A2 | COMPOSITIONS INCLUDING KETO-ESTER COMPOUNDS AND METHODS OF USING THE SAME | Fourth Principle, LLC. (US) | 2020-10-28 | — | — | EP | disclosed |
| US-9632410-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9632410-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-20160018732-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, PHOTOMASK AND PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-21 | — | — | US | disclosed |
| US-20150093692-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM USED THEREFOR, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAMEDEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |
| US-20120111562-A1 | Viscoelastic Composition With Improved Viscosity | RHODIA OPERATIONS (FR) | 2012-05-10 | — | — | US | disclosed |
| US-20100247771-A1 | INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-7527683-B2 | Ink for ink-jet recording, ink set, and ink-jet recording method | FUJIFILM CORPORATION (JP) | 2009-05-05 | — | — | US | disclosed |
| US-7438752-B2 | Ink composition and recording method | FUJIFILM CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-7404851-B2 | Ink composition and recording method using the same | FUJIFILM CORPORATION (JP) | 2008-07-29 | — | — | US | disclosed |
| US-7291212-B2 | Ink and ink set for ink jet printing and method of ink jet printing | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-20070176992-A1 | Ink composition and recording method | FUJIFILM CORPORATION (JP) | 2007-08-02 | — | — | US | disclosed |
| US-20070176991-A1 | Ink composition and recording method using the same | FUJIFILM CORPORATION (JP) | 2007-08-02 | — | — | US | disclosed |